Thermally assisted nanotransfer printing with sub-20-nm resolution and 8-inch wafer scalability
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Park, Tae Wan | - |
dc.contributor.author | Byun, Myunghwan | - |
dc.contributor.author | Jung, Hyunsung | - |
dc.contributor.author | Lee, Gyu Rac | - |
dc.contributor.author | Park, Jae Hong | - |
dc.contributor.author | Jang, Hyun-Ik | - |
dc.contributor.author | Lee, Jung Woo | - |
dc.contributor.author | Kwon, Se Hun | - |
dc.contributor.author | Hong, Seungbum | - |
dc.contributor.author | Lee, Jong-Heun | - |
dc.contributor.author | Jung, Yeon Sik | - |
dc.contributor.author | Kim, Kwang Ho | - |
dc.contributor.author | Park, Woon Ik | - |
dc.date.accessioned | 2021-08-30T19:49:57Z | - |
dc.date.available | 2021-08-30T19:49:57Z | - |
dc.date.created | 2021-06-19 | - |
dc.date.issued | 2020-07 | - |
dc.identifier.issn | 2375-2548 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/54494 | - |
dc.description.abstract | Nanotransfer printing (nTP) has attracted considerable attention due to its good pattern resolution, process simplicity, and cost-effectiveness. However, the development of a large-area nTP process has been hampered by critical reliability issues related to the uniform replication and regular transfer printing of functional nanomaterials. Here, we present a very practical thermally assisted nanotransfer printing (T-nTP) process that can easily produce well-ordered nanostructures on an 8-inch wafer via the use of a heat-rolling press system that provides both uniform pressure and heat. We also demonstrate various complex pattern geometries, such as wave, square, nut, zigzag, and elliptical nanostructures, on diverse substrates via T-nTP. Furthermore, we demonstrate how to obtain a high-density crossbar metal-insulator-metal memristive array using a combined method of T-nTP and directed self-assembly. We expect that the state-of-the-art T-nTP process presented here combined with other emerging patterning techniques will be especially useful for the large-area nanofabrication of various devices. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | AMER ASSOC ADVANCEMENT SCIENCE | - |
dc.subject | NANOIMPRINT LITHOGRAPHY | - |
dc.subject | FILMS | - |
dc.subject | NANOSTRUCTURES | - |
dc.subject | NANOPATTERNS | - |
dc.subject | POLYSTYRENE | - |
dc.subject | ELECTRONICS | - |
dc.title | Thermally assisted nanotransfer printing with sub-20-nm resolution and 8-inch wafer scalability | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Lee, Jong-Heun | - |
dc.identifier.doi | 10.1126/sciadv.abb6462 | - |
dc.identifier.scopusid | 2-s2.0-85090075761 | - |
dc.identifier.wosid | 000556543100037 | - |
dc.identifier.bibliographicCitation | SCIENCE ADVANCES, v.6, no.31 | - |
dc.relation.isPartOf | SCIENCE ADVANCES | - |
dc.citation.title | SCIENCE ADVANCES | - |
dc.citation.volume | 6 | - |
dc.citation.number | 31 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalWebOfScienceCategory | Multidisciplinary Sciences | - |
dc.subject.keywordPlus | NANOIMPRINT LITHOGRAPHY | - |
dc.subject.keywordPlus | FILMS | - |
dc.subject.keywordPlus | NANOSTRUCTURES | - |
dc.subject.keywordPlus | NANOPATTERNS | - |
dc.subject.keywordPlus | POLYSTYRENE | - |
dc.subject.keywordPlus | ELECTRONICS | - |
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