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Characteristic Enhancement of Trench IGBT by Deep P+ Layer beneath the Trench Emitter Ion Implantation

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dc.contributor.authorSung, Man Young-
dc.date.accessioned2021-08-31T02:31:09Z-
dc.date.available2021-08-31T02:31:09Z-
dc.date.created2021-04-22-
dc.date.issued2008-07-08-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/56472-
dc.publisherIEICE-
dc.subjectIGBT, Trench, Deep P+ Layer-
dc.titleCharacteristic Enhancement of Trench IGBT by Deep P+ Layer beneath the Trench Emitter Ion Implantation-
dc.typeConference-
dc.contributor.affiliatedAuthorSung, Man Young-
dc.identifier.bibliographicCitationITC-CSCC 2008( The 23rd International Technical Conference on Circuits/Systems, Computers and Communications), pp.1665 - 1668-
dc.relation.isPartOfITC-CSCC 2008( The 23rd International Technical Conference on Circuits/Systems, Computers and Communications)-
dc.relation.isPartOfProceedings of ITC-CSCC 2008( The 23rd International Technical Conference on Circuits/Systems, Compu-
dc.citation.titleITC-CSCC 2008( The 23rd International Technical Conference on Circuits/Systems, Computers and Communications)-
dc.citation.startPage1665-
dc.citation.endPage1668-
dc.citation.conferencePlaceJA-
dc.citation.conferenceDate2008-07-06-
dc.type.rimsCONF-
dc.description.journalClass1-
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