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Etching Characteristics and Mechanism of VO2 in inductively coupled plasma
- Authors
- Kwon, Kwang-Ho
- Keywords
- Etching characteristics, VO2 film
- Issue Date
- 24-Jun-2008
- Publisher
- Center for Frontier Materials and Micro/Nano Science and Technology, NCKU
- Citation
- The 4th Asia Pacific Conference on Transducers and Micro/Nano Technology, pp.71
- Conference Name
- The 4th Asia Pacific Conference on Transducers and Micro/Nano Technology
- Place
- CH
tainan, Taiwan
- Conference Date
- 2008-06-22
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Related Researcher
- Kwon, Kwang Ho
- Department of Control and Instrumentation Engineering