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Characteristics of ZnO Thin Films Grown by Atomic Layer Deposition Method with Temperature Variation

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dc.contributor.authorBYUN, Dong Jin-
dc.date.accessioned2021-08-31T17:49:01Z-
dc.date.available2021-08-31T17:49:01Z-
dc.date.created2021-04-22-
dc.date.issued2007-01-30-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/59912-
dc.publisherKOPTI-
dc.titleCharacteristics of ZnO Thin Films Grown by Atomic Layer Deposition Method with Temperature Variation-
dc.title.alternativeCharacteristics of ZnO Thin Films Grown by Atomic Layer Deposition Method with Temperature Variation-
dc.typeConference-
dc.contributor.affiliatedAuthorBYUN, Dong Jin-
dc.identifier.bibliographicCitationICDL 2007 Proceedings of The 1st International Conference on Display LEDs-
dc.relation.isPartOfICDL 2007 Proceedings of The 1st International Conference on Display LEDs-
dc.relation.isPartOfICDL 2007 Proceedings of The 1st International Conference on Display LEDs-
dc.citation.titleICDL 2007 Proceedings of The 1st International Conference on Display LEDs-
dc.citation.conferencePlaceKO-
dc.citation.conferenceDate2007-01-30-
dc.type.rimsCONF-
dc.description.journalClass2-
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공과대학 (신소재공학부)
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