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Programmable Multilevel Memtransistors Based on van der Waals Heterostructures

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dc.contributor.authorPark, Hyunik-
dc.contributor.authorMastro, Michael A.-
dc.contributor.authorTadjer, Marko J.-
dc.contributor.authorKim, Jihyun-
dc.date.accessioned2021-09-01T04:57:47Z-
dc.date.available2021-09-01T04:57:47Z-
dc.date.created2021-06-19-
dc.date.issued2019-10-
dc.identifier.issn2199-160X-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/62661-
dc.description.abstractNeuromorphic computing that mimics the energy-efficient cortical neural network in the human brain is attractive because of its possibility to process complex and massive data sets and achieve fast computing capability. Herein, a heterosynaptic and programmable memtransistor architecture with high computing functionality is reported by monolithically integrating a hexagonal boron nitride (h-BN) memristor with a molybdenum disulfide (MoS2) transistor. Memristors consisting of a vertically stacked van der Waals materials (multilayer graphene (MLG) and h-BN) exhibit a stable bipolar resistive switching behavior with a memory window more than three orders of magnitude due to the formation and rupture of the metallic filament within the h-BN layer. By controlling the resistance state of the h-BN memristor, the behaviors of the memtransistor can be programmed with a high switching ratio of approximate to 10(4), showing approximate to 16 pW standby power consumption. A multistate computing window and tunable current on/off ratio can be achieved by controlling the synaptic weight of the memristor, demonstrating that the presented 2D architecture can be exploited as a logic inverter device. The results pave the way toward the development of highly functional neuromorphic systems for the next-generation in-memory computing.-
dc.languageEnglish-
dc.language.isoen-
dc.publisherWILEY-
dc.subjectDIELECTRIC-BREAKDOWN-
dc.subjectARCHITECTURE-
dc.titleProgrammable Multilevel Memtransistors Based on van der Waals Heterostructures-
dc.typeArticle-
dc.contributor.affiliatedAuthorKim, Jihyun-
dc.identifier.doi10.1002/aelm.201900333-
dc.identifier.scopusid2-s2.0-85073577178-
dc.identifier.wosid000479632700001-
dc.identifier.bibliographicCitationADVANCED ELECTRONIC MATERIALS, v.5, no.10-
dc.relation.isPartOfADVANCED ELECTRONIC MATERIALS-
dc.citation.titleADVANCED ELECTRONIC MATERIALS-
dc.citation.volume5-
dc.citation.number10-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusDIELECTRIC-BREAKDOWN-
dc.subject.keywordPlusARCHITECTURE-
dc.subject.keywordAuthor2D materials-
dc.subject.keywordAuthorheterostructures-
dc.subject.keywordAuthorin-memory computing-
dc.subject.keywordAuthormemristors-
dc.subject.keywordAuthormemtransistors-
dc.subject.keywordAuthorneuromorphic-
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