Facile and precise fabrication of 10-nm nanostructures on soft and hard substrates
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Woo, Ju Yeon | - |
dc.contributor.author | Jo, Sunghwan | - |
dc.contributor.author | Oh, Jun Ho | - |
dc.contributor.author | Kim, Ju Tae | - |
dc.contributor.author | Han, Chang-Soo | - |
dc.date.accessioned | 2021-09-01T10:01:30Z | - |
dc.date.available | 2021-09-01T10:01:30Z | - |
dc.date.created | 2021-06-19 | - |
dc.date.issued | 2019-08-01 | - |
dc.identifier.issn | 0169-4332 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/63575 | - |
dc.description.abstract | One of the major challenges in the field of nanotechnology is the facile and inexpensive fabrication of < 10-nm nanostructures with a defect-free and precise pattern over a large area. Nanoimprint lithography (NIL) is a nanopatterning method that allows low-cost, fast production, and large-scale fabrication, but it needs improvement with regard to achieving a high resolution over a large area, processing on soft substrates, and nanomaterial patterning. Herein, it is demonstrated 10-nm patterning on soft and hard substrates via an advanced nanoimprint process. With a 100-nm master mold, both soft and hard molds with reduced pattern sizes (50, 20, 10, and 5 nm) are first fabricated using atomic layer deposition (ALD) of Al2O3. After surface functionalization of the mold, nanoscale patterns are imprinted on both hard (Si) and soft polyethylene terephthalate substrates, which result in structures with a pattern size of 10 nm. Using a hybrid supporting layer poly(methyl methacrylate) (PMMA)/poly(vinyl alcohol) (PVA) and ion sputter etching, a well-defined and clean sub-10 nm nanostructure is achieved for the nanomaterial on the substrate after lift-off and thermal annealing processes. Using this method, a graphene nanoribbon 10 nm wide is fabricated. Our approach is suitable for the fabrication of devices and structures with a 10-nm-scale pattern over a large area. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | ELSEVIER SCIENCE BV | - |
dc.subject | NANOIMPRINT LITHOGRAPHY | - |
dc.subject | GRAPHENE NANORIBBONS | - |
dc.subject | SEMICONDUCTOR NANOWIRES | - |
dc.subject | TRANSISTORS | - |
dc.title | Facile and precise fabrication of 10-nm nanostructures on soft and hard substrates | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Woo, Ju Yeon | - |
dc.contributor.affiliatedAuthor | Han, Chang-Soo | - |
dc.identifier.doi | 10.1016/j.apsusc.2019.04.035 | - |
dc.identifier.scopusid | 2-s2.0-85064601003 | - |
dc.identifier.wosid | 000471830700035 | - |
dc.identifier.bibliographicCitation | APPLIED SURFACE SCIENCE, v.484, pp.317 - 325 | - |
dc.relation.isPartOf | APPLIED SURFACE SCIENCE | - |
dc.citation.title | APPLIED SURFACE SCIENCE | - |
dc.citation.volume | 484 | - |
dc.citation.startPage | 317 | - |
dc.citation.endPage | 325 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Chemistry | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Physical | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Coatings & Films | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
dc.subject.keywordPlus | NANOIMPRINT LITHOGRAPHY | - |
dc.subject.keywordPlus | GRAPHENE NANORIBBONS | - |
dc.subject.keywordPlus | SEMICONDUCTOR NANOWIRES | - |
dc.subject.keywordPlus | TRANSISTORS | - |
dc.subject.keywordAuthor | Nanofabrication | - |
dc.subject.keywordAuthor | Nanoimprint lithography | - |
dc.subject.keywordAuthor | Mold | - |
dc.subject.keywordAuthor | Atomic layer deposition | - |
dc.subject.keywordAuthor | Ion sputter etching | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
(02841) 서울특별시 성북구 안암로 14502-3290-1114
COPYRIGHT © 2021 Korea University. All Rights Reserved.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.