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Residual modulation reduction in optical sectioning using a suitable spatial light modulator waveform

Authors
Han, Jeong-HeonYoo, Nak-WonKim, Myung-HaJu, Byeong-KwonPark, Min-Chul
Issue Date
1-8월-2019
Publisher
OPTICAL SOC AMER
Citation
APPLIED OPTICS, v.58, no.22, pp.5883 - 5891
Indexed
SCIE
SCOPUS
Journal Title
APPLIED OPTICS
Volume
58
Number
22
Start Page
5883
End Page
5891
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/63583
DOI
10.1364/AO.58.005883
ISSN
1559-128X
Abstract
We propose a method to improve the axial response of structured illumination microscopy via selection of an illumination pattern with a sinusoidal or square wave within the cutoff frequency of the imaging system. Residual modulation within a sectioned image is mitigated by accurate phase-shifting via the electrical spatial light modulator control signal, which is based on an illumination pattern having a suitable waveform. Reduction in residual modulation is observed in the sinusoidal pattern with a spatial frequency sufficiently below the cutoff frequency of the imaging system. This reduction is larger for the square wave as the spatial frequency approaches one-third of the cutoff frequency. (C) 2019 Optical Society of America.
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