Detailed Information

Cited 0 time in webofscience Cited 0 time in scopus
Metadata Downloads

Co-60 Gamma Ray Damage in Homoepitaxial beta-Ga2O3 Schottky Rectifiers

Full metadata record
DC Field Value Language
dc.contributor.authorYang, Jiancheng-
dc.contributor.authorKoller, Gregory J.-
dc.contributor.authorFares, Chaker-
dc.contributor.authorRen, F.-
dc.contributor.authorPearton, S. J.-
dc.contributor.authorBae, Jinho-
dc.contributor.authorKim, Jihyun-
dc.contributor.authorSmith, David J.-
dc.date.accessioned2021-09-01T19:05:41Z-
dc.date.available2021-09-01T19:05:41Z-
dc.date.created2021-06-19-
dc.date.issued2019-02-13-
dc.identifier.issn2162-8769-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/67640-
dc.description.abstractbeta-Ga2O3 Schottky rectifiers consisting of thick (10 mu m) epitaxial drift regions on conducting substrates are shown to have a high tolerance to Co-60 gamma ray irradiation. This is due to the low carrier removal rate of <1 cm(-1) for gamma rays, which contrasts to values of 300-500 cm(-1) for MeV protons and alpha particles in the same rectifier structures. Changes in diode ideality factor, Schottky barrier height, on-resistance, on-off ratio, and reverse recovery time are all minimal for fluences up to 2 x 10(16) cm(-2) (absorbed dose of 100 kGy (Si)). These results are consistent with previous reports on gamma-irradiation of Ga2O3 metal oxide semiconductor field effect transistors (MOSFETs) where changes were ascribed to damage in the gate dielectric and not to the Ga2O3 itself. (c) The Author(s) 2019. Published by ECS. This is an open access article distributed under the terms of the Creative Commons Attribution 4.0 License.-
dc.languageEnglish-
dc.language.isoen-
dc.publisherELECTROCHEMICAL SOC INC-
dc.subjectDISPLACEMENT DAMAGE-
dc.subjectCHARGE COLLECTION-
dc.subjectIRRADIATION-
dc.subjectRADIATION-
dc.subjectPROTON-
dc.subjectGROWTH-
dc.subjectSEMICONDUCTORS-
dc.subjectDEFECTS-
dc.subjectSILICON-
dc.subjectDC-
dc.titleCo-60 Gamma Ray Damage in Homoepitaxial beta-Ga2O3 Schottky Rectifiers-
dc.typeArticle-
dc.contributor.affiliatedAuthorKim, Jihyun-
dc.identifier.doi10.1149/2.0091907jss-
dc.identifier.scopusid2-s2.0-85072082340-
dc.identifier.wosid000458660500002-
dc.identifier.bibliographicCitationECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, v.8, no.7, pp.Q3041 - Q3045-
dc.relation.isPartOfECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY-
dc.citation.titleECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY-
dc.citation.volume8-
dc.citation.number7-
dc.citation.startPageQ3041-
dc.citation.endPageQ3045-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusDISPLACEMENT DAMAGE-
dc.subject.keywordPlusCHARGE COLLECTION-
dc.subject.keywordPlusIRRADIATION-
dc.subject.keywordPlusRADIATION-
dc.subject.keywordPlusPROTON-
dc.subject.keywordPlusGROWTH-
dc.subject.keywordPlusSEMICONDUCTORS-
dc.subject.keywordPlusDEFECTS-
dc.subject.keywordPlusSILICON-
dc.subject.keywordPlusDC-
Files in This Item
There are no files associated with this item.
Appears in
Collections
College of Engineering > Department of Chemical and Biological Engineering > 1. Journal Articles

qrcode

Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.

Altmetrics

Total Views & Downloads

BROWSE