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Metal patterning process on rigid and flexible substrates using nanoimprint lithography and resist pattern transfer technique

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dc.contributor.authorLee, Heon-
dc.date.accessioned2021-09-01T20:32:27Z-
dc.date.available2021-09-01T20:32:27Z-
dc.date.created2021-04-22-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/68006-
dc.publisherThe Society of Nanoscience and Nanotechnology-
dc.titleMetal patterning process on rigid and flexible substrates using nanoimprint lithography and resist pattern transfer technique-
dc.typeConference-
dc.contributor.affiliatedAuthorLee, Heon-
dc.identifier.bibliographicCitationMPA 2008 (The International Meeting on Developments in Materials, Processes and Applications of Nanotechnology)-
dc.relation.isPartOfMPA 2008 (The International Meeting on Developments in Materials, Processes and Applications of Nanotechnology)-
dc.citation.titleMPA 2008 (The International Meeting on Developments in Materials, Processes and Applications of Nanotechnology)-
dc.citation.conferencePlaceUK-
dc.citation.conferenceDate2008-01-06-
dc.type.rimsCONF-
dc.description.journalClass1-
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공과대학 (신소재공학부)
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