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Role of Al₂O₃buffer layer for ZnO-based transparent thin film transistors with HfO₂gate-insulator

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dc.contributor.authorJu, Byeongkwon-
dc.date.accessioned2021-09-01T22:03:32Z-
dc.date.available2021-09-01T22:03:32Z-
dc.date.created2021-04-22-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/68495-
dc.publisherMRS-
dc.titleRole of Al₂O₃buffer layer for ZnO-based transparent thin film transistors with HfO₂gate-insulator-
dc.typeConference-
dc.contributor.affiliatedAuthorJu, Byeongkwon-
dc.identifier.bibliographicCitation2nd International Symposium on Transparent Conductive Oxides 2008-
dc.relation.isPartOf2nd International Symposium on Transparent Conductive Oxides 2008-
dc.citation.title2nd International Symposium on Transparent Conductive Oxides 2008-
dc.citation.conferencePlaceGR-
dc.citation.conferenceDate2008-10-22-
dc.type.rimsCONF-
dc.description.journalClass1-
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공과대학 (전기전자공학부)
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