Orthogonally Aligned Block Copolymer Line Patterns on Minimal Topographic Patterns
- Authors
- Choi, Jaewon; Li, Yinyong; Kim, Paul Y.; Liu, Feng; Kim, Hyeyoung; Yu, Duk Man; Huh, June; Carter, Kenneth R.; Russell, Thomas P.
- Issue Date
- 7-3월-2018
- Publisher
- AMER CHEMICAL SOC
- Keywords
- block copolymers; directed self-assembly; orthogonal alignment; solvent-vapor annealing; line patterns; topographic patterns; cylindrical microdomains
- Citation
- ACS APPLIED MATERIALS & INTERFACES, v.10, no.9, pp.8324 - 8332
- Indexed
- SCIE
SCOPUS
- Journal Title
- ACS APPLIED MATERIALS & INTERFACES
- Volume
- 10
- Number
- 9
- Start Page
- 8324
- End Page
- 8332
- URI
- https://scholar.korea.ac.kr/handle/2021.sw.korea/76752
- DOI
- 10.1021/acsami.7b17713
- ISSN
- 1944-8244
- Abstract
- We demonstrate the generation of block copolymer (BCP) line patterns oriented orthogonal to a very small (minimal) topographic trench pattern over arbitrarily large areas using solvent-vapor annealing. Increasing the thickness of BCP films induced an orthogonal alignment of the BCP cylindrical microdomains, where full orthogonal alignment of the cylindrical microdomains with respect to the trench direction was obtained at a film thickness corresponding to 1.70L(0). A capillary flow of the solvent across the trenches was a critical factor in the alignment of the cylindrical microdomains. Grazing incidence small-angle X-ray scattering was used to determine the orientation function of the microdomains, with a value of 0.997 being found reflecting a nearly perfect orientation. This approach to produce orthogonally aligned BCP line patterns could be extended to the nanomanufacturing and fabrication of hierarchical nanostructures.
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Collections - College of Engineering > Department of Chemical and Biological Engineering > 1. Journal Articles
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