Dynamic Change in Color Filter Layers during the Baking Process by Multi-Speckle Diffusing Wave Spectroscopy
- Authors
- Park, Baek Sung; Hyung, Kyung Hee; Oh, Gwi Jeong; Jung, Hyun Wook
- Issue Date
- 12월-2017
- Publisher
- WILEY-V C H VERLAG GMBH
- Keywords
- Autocorrelation function; Color filter; Characteristic relaxation time; Multi-speckle diffusing wave spectroscopy; Particle dynamics
- Citation
- CHEMICAL ENGINEERING & TECHNOLOGY, v.40, no.12, pp.2230 - 2237
- Indexed
- SCIE
SCOPUS
- Journal Title
- CHEMICAL ENGINEERING & TECHNOLOGY
- Volume
- 40
- Number
- 12
- Start Page
- 2230
- End Page
- 2237
- URI
- https://scholar.korea.ac.kr/handle/2021.sw.korea/81360
- DOI
- 10.1002/ceat.201700147
- ISSN
- 0930-7516
- Abstract
- Undercut defects of color filter (CF) layers, which inevitably occur in UV curing and development processes for liquid crystal displays and white organic light-emitting diodes, should be elucidated to ensure product quality and processability. The dynamic changes of the green CF layer are investigated during the baking process by examining the motion of pigment particles within the thin CF layer via multi-speckle diffusing wave spectroscopy (MSDWS). Autocorrelation functions and characteristic times for the -relaxation, which are determined using light intensities scattered from the CF layer, directly indicate thermal melting and curing stages in the process. It is confirmed that MSDWS is a reliable non-contact measurement tool for quantitatively analyzing the initial change of the CF layer during the baking process.
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Collections - College of Engineering > Department of Chemical and Biological Engineering > 1. Journal Articles
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