Detailed Information

Cited 0 time in webofscience Cited 0 time in scopus
Metadata Downloads

Effects of Annealing on Firing Stability of a Al2O3/SiNx Stack Passivation Layer for Crystalline Silicon Solar Cells

Authors
Kim, Jae EunBae, SoohyunSong, In SeolHyun, Ji YeonLee, Kyung DongShin, Seung HyunKang, YoonmookLee, Hae-SeokKim, Donghwan
Issue Date
7월-2017
Publisher
AMER SCIENTIFIC PUBLISHERS
Keywords
Al2O3; SiNx; Blistering; Annealing Effect; Firing Stability; Passivation; Silicon Solar Cell
Citation
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.17, no.7, pp.5050 - 5054
Indexed
SCIE
SCOPUS
Journal Title
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY
Volume
17
Number
7
Start Page
5050
End Page
5054
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/83007
DOI
10.1166/jnn.2017.14280
ISSN
1533-4880
Abstract
Because of its high passivation quality, Al2O3 is used as the front passivation layer in commercial n-type silicon solar cells. The front passivation layer of a solar cell should have passivation properties and antireflection properties. For process efficiency and protection, SiNx is used as a capping layer on Al2O3. However, the Al2O3/SiNx stack layer has an issue with firing stability during screen printing of the cell, similar to the Al2O3 layer. This is because the Al2O3/SiNx stack layer needs to be fired to form the metal contact. In this study, the firing stability of the Al2O3/SiNx stack layer is investigated and the relation between blister formation and passivation is elucidated. Annealing improves the passivation quality of layers after firing. The order of annealing and stack formation is also one of parameters for firing stability. We used thermal atomic layer deposition to form Al2O3 and plasma enhanced chemical vapor deposition to form SiNx. The refractive index of each layer is 1.6 and 2.0, respectively, and the thickness is 10 nm and 70 nm, respectively. Rapid thermal processing was used for the annealing and firing. Passivation qualities were determined by quasi steady-state photo conductance, and blistering was observed by optical microscopy. Although there is some blistering on the sample annealed at 600 degrees C, good passivation and good firing stability was observed. We identified that a low density of blisters formed during the annealing step improves the firing stability of the passivation layer by preventing abrupt blister formation during the firing step, which is the cause of thermal degradation.
Files in This Item
There are no files associated with this item.
Appears in
Collections
Graduate School of Energy and Environment (KU-KIST GREEN SCHOOL) > Department of Energy and Environment > 1. Journal Articles
College of Engineering > Department of Materials Science and Engineering > 1. Journal Articles

qrcode

Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.

Related Researcher

Researcher KIM, Dong hwan photo

KIM, Dong hwan
공과대학 (신소재공학부)
Read more

Altmetrics

Total Views & Downloads

BROWSE