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1.5 MeV electron irradiation damage in beta-Ga2O3 vertical rectifiers

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dc.contributor.authorYang, Jiancheng-
dc.contributor.authorRen, Fan-
dc.contributor.authorPearton, Stephen J.-
dc.contributor.authorYang, Gwangseok-
dc.contributor.authorKim, Jihyun-
dc.contributor.authorKuramata, Akito-
dc.date.accessioned2021-09-03T06:56:19Z-
dc.date.available2021-09-03T06:56:19Z-
dc.date.created2021-06-16-
dc.date.issued2017-05-
dc.identifier.issn1071-1023-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/83675-
dc.description.abstractVertical rectifiers fabricated on epi Ga2O3 on bulk beta-Ga2O3 were subject to 1.5MeV electron irradiation at fluences from 1.79 x 10(15) to 1.43 x 10(16) cm(-2) at a fixed beam current of 10(-3) A. The electron irradiation caused a reduction in carrier concentration in the epi Ga2O3, with a carrier removal rate of 4.9 cm(-1). The 2 kT region of the forward current-voltage characteristics increased due to electron-induced damage, with an increase in diode ideality factor of similar to 8% at the highest fluence and a more than 2 order of magnitude increase in on-state resistance. There was a significant reduction in reverse bias current, which scaled with electron fluence. The on/off ratio at -10V reverse bias voltage was severely degraded by electron irradiation, decreasing from similar to 10(7) in the reference diodes to similar to 2 x 10(4) for the 1.43 x 10(16) cm(-2) fluence. The reverse recovery characteristics showed little change even at the highest fluence, with values in the range of 21-25 ns for all rectifiers. (C) 2017 American Vacuum Society.-
dc.languageEnglish-
dc.language.isoen-
dc.publisherA V S AMER INST PHYSICS-
dc.subjectSCHOTTKY-BARRIER DIODES-
dc.subjectDEVICES-
dc.subjectMOVPE-
dc.title1.5 MeV electron irradiation damage in beta-Ga2O3 vertical rectifiers-
dc.typeArticle-
dc.contributor.affiliatedAuthorKim, Jihyun-
dc.identifier.doi10.1116/1.4983377-
dc.identifier.scopusid2-s2.0-85018882376-
dc.identifier.wosid000402053900013-
dc.identifier.bibliographicCitationJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, v.35, no.3-
dc.relation.isPartOfJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B-
dc.citation.titleJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B-
dc.citation.volume35-
dc.citation.number3-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusSCHOTTKY-BARRIER DIODES-
dc.subject.keywordPlusDEVICES-
dc.subject.keywordPlusMOVPE-
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