1.5 MeV electron irradiation damage in beta-Ga2O3 vertical rectifiers
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Yang, Jiancheng | - |
dc.contributor.author | Ren, Fan | - |
dc.contributor.author | Pearton, Stephen J. | - |
dc.contributor.author | Yang, Gwangseok | - |
dc.contributor.author | Kim, Jihyun | - |
dc.contributor.author | Kuramata, Akito | - |
dc.date.accessioned | 2021-09-03T06:56:19Z | - |
dc.date.available | 2021-09-03T06:56:19Z | - |
dc.date.created | 2021-06-16 | - |
dc.date.issued | 2017-05 | - |
dc.identifier.issn | 1071-1023 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/83675 | - |
dc.description.abstract | Vertical rectifiers fabricated on epi Ga2O3 on bulk beta-Ga2O3 were subject to 1.5MeV electron irradiation at fluences from 1.79 x 10(15) to 1.43 x 10(16) cm(-2) at a fixed beam current of 10(-3) A. The electron irradiation caused a reduction in carrier concentration in the epi Ga2O3, with a carrier removal rate of 4.9 cm(-1). The 2 kT region of the forward current-voltage characteristics increased due to electron-induced damage, with an increase in diode ideality factor of similar to 8% at the highest fluence and a more than 2 order of magnitude increase in on-state resistance. There was a significant reduction in reverse bias current, which scaled with electron fluence. The on/off ratio at -10V reverse bias voltage was severely degraded by electron irradiation, decreasing from similar to 10(7) in the reference diodes to similar to 2 x 10(4) for the 1.43 x 10(16) cm(-2) fluence. The reverse recovery characteristics showed little change even at the highest fluence, with values in the range of 21-25 ns for all rectifiers. (C) 2017 American Vacuum Society. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | A V S AMER INST PHYSICS | - |
dc.subject | SCHOTTKY-BARRIER DIODES | - |
dc.subject | DEVICES | - |
dc.subject | MOVPE | - |
dc.title | 1.5 MeV electron irradiation damage in beta-Ga2O3 vertical rectifiers | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Kim, Jihyun | - |
dc.identifier.doi | 10.1116/1.4983377 | - |
dc.identifier.scopusid | 2-s2.0-85018882376 | - |
dc.identifier.wosid | 000402053900013 | - |
dc.identifier.bibliographicCitation | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, v.35, no.3 | - |
dc.relation.isPartOf | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | - |
dc.citation.title | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | - |
dc.citation.volume | 35 | - |
dc.citation.number | 3 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Engineering | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Engineering, Electrical & Electronic | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.subject.keywordPlus | SCHOTTKY-BARRIER DIODES | - |
dc.subject.keywordPlus | DEVICES | - |
dc.subject.keywordPlus | MOVPE | - |
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