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Determination of intrinsic mobility of a bilayer oxide thin-film transistor by pulsed I-V method

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dc.contributor.authorWoo, Hyunsuk-
dc.contributor.authorKim, Taeho-
dc.contributor.authorHur, Jihyun-
dc.contributor.authorJeon, Sanghun-
dc.date.accessioned2021-09-03T07:03:36Z-
dc.date.available2021-09-03T07:03:36Z-
dc.date.created2021-06-16-
dc.date.issued2017-04-28-
dc.identifier.issn0957-4484-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/83716-
dc.description.abstractAmorphous oxide semiconductor thin-film transistors (TFT) have been considered as outstanding switch devices owing to their high mobility. However, because of their amorphous channel material with a certain level of density of states, a fast transient charging effect in an oxide TFT occurs, leading to an underestimation of the mobility value. In this paper, the effects of the fast charging of high-performance bilayer oxide semiconductor TFTs on mobility are examined in order to determine an accurate mobility extraction method. In addition, an approach based on a pulse I-D-V-G measurement method is proposed to determine the intrinsic mobility value. Even with the short pulse I-D-V-G measurement, a certain level of fast transient charge trapping cannot be avoided as long as the charge-trap start time is shorter than the pulse rising time. Using a pulse-amplitude-dependent threshold voltage characterization method, we estimated a correction factor for the apparent mobility, thus allowing us to determine the intrinsic mobility.-
dc.languageEnglish-
dc.language.isoen-
dc.publisherIOP PUBLISHING LTD-
dc.subjectELECTRON-TRAPPING CHARACTERIZATION-
dc.subjectCARRIER TRANSPORT-
dc.subjectGATE DIELECTRICS-
dc.subjectSEMICONDUCTORS-
dc.subjectPERFORMANCE-
dc.titleDetermination of intrinsic mobility of a bilayer oxide thin-film transistor by pulsed I-V method-
dc.typeArticle-
dc.contributor.affiliatedAuthorJeon, Sanghun-
dc.identifier.doi10.1088/1361-6528/aa651c-
dc.identifier.scopusid2-s2.0-85017555591-
dc.identifier.wosid000398258200001-
dc.identifier.bibliographicCitationNANOTECHNOLOGY, v.28, no.17-
dc.relation.isPartOfNANOTECHNOLOGY-
dc.citation.titleNANOTECHNOLOGY-
dc.citation.volume28-
dc.citation.number17-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusELECTRON-TRAPPING CHARACTERIZATION-
dc.subject.keywordPlusCARRIER TRANSPORT-
dc.subject.keywordPlusGATE DIELECTRICS-
dc.subject.keywordPlusSEMICONDUCTORS-
dc.subject.keywordPlusPERFORMANCE-
dc.subject.keywordAuthoramorphous-
dc.subject.keywordAuthornanocrystalline-
dc.subject.keywordAuthoroxide semiconductor-
dc.subject.keywordAuthorthin film transistor-
dc.subject.keywordAuthorcharge trapping-
dc.subject.keywordAuthorfast transient charging-
dc.subject.keywordAuthormobility-
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