Detailed Information

Cited 0 time in webofscience Cited 0 time in scopus
Metadata Downloads

Degradation of diclofenac and carbamazepine by the copper(II)-catalyzed dark and photo-assisted Fenton-like systems

Full metadata record
DC Field Value Language
dc.contributor.authorLee, Hongshin-
dc.date.accessioned2021-09-03T07:35:20Z-
dc.date.available2021-09-03T07:35:20Z-
dc.date.created2021-06-21-
dc.date.issued2014-01-
dc.identifier.issn1385-8947-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/83877-
dc.description.abstractThe oxidative degradation of two pharmaceutical compounds (diclofenac and carbamazepine, denoted as DCF and CBZ) by the Cu(II)-catalyzed Fenton (Cu(II)/H2O2) and the photo-Fenton (UV/Cu(II)/H2O2) systems was examined, with a focus on the parameters that affected the oxidant production, such as the solution pH, the Cu(II) concentration, and the radical scavengers. The degradation of DCF and CBZ in the Cu(II)/H2O2 and UV/Cu(II)/H2O2 systems followed the pseudo-first-order kinetics, which exhibited increasing rate constants with the increasing concentration of Cu(II). In the Cu(II)/H2O2 system, the optimal degradation of the target contaminants was observed at approximately pH 8, which is attributed to the combined effects of two pH-dependent factors: (1) the accelerated Cu(II) reduction by H2O2 with increasing pH and (2) the shift of the main oxidant from the hydroxyl radical (OH) to the cupryl ion (Cu[III]) at high pH values. The complete prevention of the degradation of DCF and CBZ in the presence of excess tert-butanol indicates that OH is dominantly responsible for the contaminant degradation. The UV-A irradiation significantly enhanced the degradation of the target contaminants over the entire pH range studied (pH 3-10) and slightly shifted the optimal pH conditions to lower v-
dc.languageEnglish-
dc.language.isoen-
dc.publisherELSEVIER SCIENCE SA-
dc.titleDegradation of diclofenac and carbamazepine by the copper(II)-catalyzed dark and photo-assisted Fenton-like systems-
dc.typeArticle-
dc.contributor.affiliatedAuthorLee, Hongshin-
dc.identifier.doi10.1016/j.cej.2014.02.037-
dc.identifier.bibliographicCitationCHEMICAL ENGINEERING JOURNAL, v.245, pp.258 - 264-
dc.relation.isPartOfCHEMICAL ENGINEERING JOURNAL-
dc.citation.titleCHEMICAL ENGINEERING JOURNAL-
dc.citation.volume245-
dc.citation.startPage258-
dc.citation.endPage264-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.subject.keywordAuthorCopper-
dc.subject.keywordAuthorFenton reaction-
dc.subject.keywordAuthorAdvanced oxidation-
dc.subject.keywordAuthorPharmaceutical compounds-
Files in This Item
There are no files associated with this item.
Appears in
Collections
ETC > 1. Journal Articles

qrcode

Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.

Altmetrics

Total Views & Downloads

BROWSE