Degradation of diclofenac and carbamazepine by the copper(II)-catalyzed dark and photo-assisted Fenton-like systems
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Lee, Hongshin | - |
dc.date.accessioned | 2021-09-03T07:35:20Z | - |
dc.date.available | 2021-09-03T07:35:20Z | - |
dc.date.created | 2021-06-21 | - |
dc.date.issued | 2014-01 | - |
dc.identifier.issn | 1385-8947 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/83877 | - |
dc.description.abstract | The oxidative degradation of two pharmaceutical compounds (diclofenac and carbamazepine, denoted as DCF and CBZ) by the Cu(II)-catalyzed Fenton (Cu(II)/H2O2) and the photo-Fenton (UV/Cu(II)/H2O2) systems was examined, with a focus on the parameters that affected the oxidant production, such as the solution pH, the Cu(II) concentration, and the radical scavengers. The degradation of DCF and CBZ in the Cu(II)/H2O2 and UV/Cu(II)/H2O2 systems followed the pseudo-first-order kinetics, which exhibited increasing rate constants with the increasing concentration of Cu(II). In the Cu(II)/H2O2 system, the optimal degradation of the target contaminants was observed at approximately pH 8, which is attributed to the combined effects of two pH-dependent factors: (1) the accelerated Cu(II) reduction by H2O2 with increasing pH and (2) the shift of the main oxidant from the hydroxyl radical (OH) to the cupryl ion (Cu[III]) at high pH values. The complete prevention of the degradation of DCF and CBZ in the presence of excess tert-butanol indicates that OH is dominantly responsible for the contaminant degradation. The UV-A irradiation significantly enhanced the degradation of the target contaminants over the entire pH range studied (pH 3-10) and slightly shifted the optimal pH conditions to lower v | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | ELSEVIER SCIENCE SA | - |
dc.title | Degradation of diclofenac and carbamazepine by the copper(II)-catalyzed dark and photo-assisted Fenton-like systems | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Lee, Hongshin | - |
dc.identifier.doi | 10.1016/j.cej.2014.02.037 | - |
dc.identifier.bibliographicCitation | CHEMICAL ENGINEERING JOURNAL, v.245, pp.258 - 264 | - |
dc.relation.isPartOf | CHEMICAL ENGINEERING JOURNAL | - |
dc.citation.title | CHEMICAL ENGINEERING JOURNAL | - |
dc.citation.volume | 245 | - |
dc.citation.startPage | 258 | - |
dc.citation.endPage | 264 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.subject.keywordAuthor | Copper | - |
dc.subject.keywordAuthor | Fenton reaction | - |
dc.subject.keywordAuthor | Advanced oxidation | - |
dc.subject.keywordAuthor | Pharmaceutical compounds | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
(02841) 서울특별시 성북구 안암로 14502-3290-1114
COPYRIGHT © 2021 Korea University. All Rights Reserved.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.