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Giant Temperature Coefficient of Resistivity and Cryogenic Sensitivity in Silicon with Galvanically Displaced Gold Nanoparticles in Freeze-Out Region

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dc.contributor.authorLee, Seung-Hoon-
dc.contributor.authorHwang, Seongpil-
dc.contributor.authorJang, Jae-Won-
dc.date.accessioned2021-09-03T10:31:05Z-
dc.date.available2021-09-03T10:31:05Z-
dc.date.created2021-06-16-
dc.date.issued2017-02-
dc.identifier.issn1936-0851-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/84805-
dc.description.abstractThe temperature coefficient of resistivity (TCR) and cryogenic sensitivity (Sr) of p-type silicon (p-Si) in the low-temperature region (10-30 K) are remarkably improved by increasing the coverage of galvanically displaced Au nanoparticles (NPs). By increase of the galvanic displacement time from 10 to 30 s, the average surface roughness (R-a) of the samples increases from 0.31 to 2.31 nm and the coverage rate of Au NPs increases from 3.1% to 21.9%. In the freeze-out region of the sample, an up to 103% increase of TCR and dramatically improved Sv of p-Si (similar to 5813%) are observed with Au coverage of 21.9% compared to p-Si without galvanically displaced Au NPs. By means of a finite element method (FEM) simulation study, it was found that the increase of surface roughness and a number of Au NPs on p-Si results in a higher temperature gradient and thermoelectric power to cause the unusual TCR and S-v values in the samples.-
dc.languageEnglish-
dc.language.isoen-
dc.publisherAMER CHEMICAL SOC-
dc.subjectELECTRICAL-PROPERTIES-
dc.subjectTHERMAL-CONDUCTIVITY-
dc.subjectDOPED SILICON-
dc.subjectAU DEPOSITION-
dc.subjectAQUEOUS HF-
dc.subjectBOLOMETER-
dc.subjectSI(111)-
dc.subjectSENSORS-
dc.subjectSURFACE-
dc.subjectFILMS-
dc.titleGiant Temperature Coefficient of Resistivity and Cryogenic Sensitivity in Silicon with Galvanically Displaced Gold Nanoparticles in Freeze-Out Region-
dc.typeArticle-
dc.contributor.affiliatedAuthorHwang, Seongpil-
dc.identifier.doi10.1021/acsnano.6b07007-
dc.identifier.scopusid2-s2.0-85014301551-
dc.identifier.wosid000395357300047-
dc.identifier.bibliographicCitationACS NANO, v.11, no.2, pp.1572 - 1580-
dc.relation.isPartOfACS NANO-
dc.citation.titleACS NANO-
dc.citation.volume11-
dc.citation.number2-
dc.citation.startPage1572-
dc.citation.endPage1580-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaChemistry-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalWebOfScienceCategoryChemistry, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryChemistry, Physical-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.subject.keywordPlusELECTRICAL-PROPERTIES-
dc.subject.keywordPlusTHERMAL-CONDUCTIVITY-
dc.subject.keywordPlusDOPED SILICON-
dc.subject.keywordPlusAU DEPOSITION-
dc.subject.keywordPlusAQUEOUS HF-
dc.subject.keywordPlusBOLOMETER-
dc.subject.keywordPlusSI(111)-
dc.subject.keywordPlusSENSORS-
dc.subject.keywordPlusSURFACE-
dc.subject.keywordPlusFILMS-
dc.subject.keywordAuthorgalvanic displacement-
dc.subject.keywordAuthortemperature coefficient of resistivity-
dc.subject.keywordAuthorbolometer-
dc.subject.keywordAuthorcryogenic sensitivity-
dc.subject.keywordAuthorAu nanoparticles-
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