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Enhanced field emission properties from carbon nanotube emitters on the nanopatterned substrate

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dc.contributor.authorKim, Se Jung-
dc.contributor.authorPark, Seol Ah-
dc.contributor.authorKim, Young-Cho-
dc.contributor.authorJu, Byeong-Kwon-
dc.date.accessioned2021-09-03T11:30:00Z-
dc.date.available2021-09-03T11:30:00Z-
dc.date.created2021-06-16-
dc.date.issued2017-01-
dc.identifier.issn1071-1023-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/85053-
dc.description.abstractThe authors investigated the field emission characteristics of printed carbon nanotubes (CNTs) on KOVAR substrates with micro-and nanosize line patterns. Microsized line patterns were fabricated using photolithography techniques followed by an inductive coupled plasma-reactive ion etching process, and laser interference lithography techniques were used to fabricate uniform nanosized patterns over a relatively large area. CNTs were printed on the patterned substrate using a screen printing method. The field emission characteristics of each patterned substrate were compared to those of a nonpatterned substrate. Results revealed that varying the pattern size has an influence on the field emission characteristics. The reduction of the pattern size results in an increase in the total surface area. This surface patterning is found to provide additional areas for CNTs to adhere to the substrates, which, in turn, results in better adhesion of CNTs. As the size of the pattern is reduced, the field emission properties are improved. Specifically, substrates with nanosized patterns exhibited both the lowest turn-on field and the highest field enhancement factor (b). (C) 2016 American Vacuum Society.-
dc.languageEnglish-
dc.language.isoen-
dc.publisherA V S AMER INST PHYSICS-
dc.subjectFABRICATION-
dc.subjectLITHOGRAPHY-
dc.subjectPASTE-
dc.subjectOPTIMIZATION-
dc.subjectDEPOSITION-
dc.subjectGROWTH-
dc.titleEnhanced field emission properties from carbon nanotube emitters on the nanopatterned substrate-
dc.typeArticle-
dc.contributor.affiliatedAuthorJu, Byeong-Kwon-
dc.identifier.doi10.1116/1.4972119-
dc.identifier.scopusid2-s2.0-85006757622-
dc.identifier.wosid000395468500037-
dc.identifier.bibliographicCitationJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, v.35, no.1-
dc.relation.isPartOfJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B-
dc.citation.titleJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B-
dc.citation.volume35-
dc.citation.number1-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusFABRICATION-
dc.subject.keywordPlusLITHOGRAPHY-
dc.subject.keywordPlusPASTE-
dc.subject.keywordPlusOPTIMIZATION-
dc.subject.keywordPlusDEPOSITION-
dc.subject.keywordPlusGROWTH-
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