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Review-Group III-Nitride-Based Ultraviolet Light-Emitting Diodes: Ways of Increasing External Quantum Efficiency

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dc.contributor.authorPark, Jae-Seong-
dc.contributor.authorKim, Jong Kyu-
dc.contributor.authorCho, Jaehee-
dc.contributor.authorSeong, Tae-Yeon-
dc.date.accessioned2021-09-03T15:00:19Z-
dc.date.available2021-09-03T15:00:19Z-
dc.date.created2021-06-16-
dc.date.issued2017-
dc.identifier.issn2162-8769-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/86313-
dc.description.abstractThere is a rapidly growing demand for highly efficient ultraviolet (UV) light sources for a wide variety of applications. In particular, state-of-the-art AlGaN deep UV light-emitting diodes (DUV LEDs) exhibit inadequately low external quantum efficiencies (EQEs). The low efficiencies are attributed to the inherent material properties of high-Al-content AlGaN including strained epitaxial layers, low carrier concentrations, and strong transverse magnetic (TM)-polarized light emission. Extensive efforts have been made to tackle these challenging issues and technological developments have been achieved and enabled the fabrication of reasonable EQE LEDs. In this review, recent advances in the growth of high-quality AlGaN epitaxial layers, transparent and reflective ohmic contacts, and light extraction for AlGaN-based UV LEDs are reviewed. (C) The Author(s) 2017. Published by ECS. All rights reserved.-
dc.languageEnglish-
dc.language.isoen-
dc.publisherELECTROCHEMICAL SOC INC-
dc.subjectELECTRON-BEAM IRRADIATION-
dc.subjectDEEP-UV LEDS-
dc.subjectTRANSPARENT CONDUCTIVE ELECTRODE-
dc.subjectRESISTANCE OHMIC CONTACTS-
dc.subjectATOMIC-LAYER EPITAXY-
dc.subjectP-TYPE CONDUCTIVITY-
dc.subjectGRAPHENE ELECTRODE-
dc.subjectHIGH-QUALITY-
dc.subjectSAPPHIRE SUBSTRATE-
dc.subjectOPTICAL-PROPERTIES-
dc.titleReview-Group III-Nitride-Based Ultraviolet Light-Emitting Diodes: Ways of Increasing External Quantum Efficiency-
dc.typeArticle-
dc.contributor.affiliatedAuthorSeong, Tae-Yeon-
dc.identifier.doi10.1149/2.0111704jss-
dc.identifier.scopusid2-s2.0-85028985816-
dc.identifier.wosid000393988500012-
dc.identifier.bibliographicCitationECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, v.6, no.4, pp.Q42 - Q52-
dc.relation.isPartOfECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY-
dc.citation.titleECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY-
dc.citation.volume6-
dc.citation.number4-
dc.citation.startPageQ42-
dc.citation.endPageQ52-
dc.type.rimsART-
dc.type.docTypeReview-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusELECTRON-BEAM IRRADIATION-
dc.subject.keywordPlusDEEP-UV LEDS-
dc.subject.keywordPlusTRANSPARENT CONDUCTIVE ELECTRODE-
dc.subject.keywordPlusRESISTANCE OHMIC CONTACTS-
dc.subject.keywordPlusATOMIC-LAYER EPITAXY-
dc.subject.keywordPlusP-TYPE CONDUCTIVITY-
dc.subject.keywordPlusGRAPHENE ELECTRODE-
dc.subject.keywordPlusHIGH-QUALITY-
dc.subject.keywordPlusSAPPHIRE SUBSTRATE-
dc.subject.keywordPlusOPTICAL-PROPERTIES-
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