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Surface and interface states of Bi2Se3 thin films investigated by optical second-harmonic generation and terahertz emission

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dc.contributor.authorHamh, S. Y.-
dc.contributor.authorPark, S. -H.-
dc.contributor.authorJerng, S. -K.-
dc.contributor.authorJeon, J. H.-
dc.contributor.authorChun, S. H.-
dc.contributor.authorJeon, J. H.-
dc.contributor.authorKahng, S. J.-
dc.contributor.authorYu, K.-
dc.contributor.authorChoi, E. J.-
dc.contributor.authorKim, S.-
dc.contributor.authorChoi, S. -H.-
dc.contributor.authorBansal, N.-
dc.contributor.authorOh, S.-
dc.contributor.authorPark, Joonbum-
dc.contributor.authorKho, Byung-Woo-
dc.contributor.authorKim, Jun Sung-
dc.contributor.authorLee, J. S.-
dc.date.accessioned2021-09-04T03:16:24Z-
dc.date.available2021-09-04T03:16:24Z-
dc.date.created2021-06-16-
dc.date.issued2016-02-01-
dc.identifier.issn0003-6951-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/89570-
dc.description.abstractWe investigate the surface and interface states of Bi2Se3 thin films by using the second-harmonic generation technique. Distinct from the surface of bulk crystals, the film surface and interface show the isotropic azimuth dependence of second-harmonic intensity, which is attributed to the formation of randomly oriented domains on the in-plane. Based on the nonlinear susceptibility deduced from the model fitting, we determine that the surface band bending induced in a space charge region occurs more strongly at the film interface facing the Al2O3 substrate or capping layer compared with the interface facing the air. We demonstrate that distinct behavior of the terahertz electric field emitted from the samples can provide further information about the surface electronic state of Bi2Se3. (C) 2016 AIP Publishing LLC.-
dc.languageEnglish-
dc.language.isoen-
dc.publisherAMER INST PHYSICS-
dc.subjectTOPOLOGICAL INSULATOR BI2SE3-
dc.subjectQUANTUM-
dc.subjectBI2TE3-
dc.titleSurface and interface states of Bi2Se3 thin films investigated by optical second-harmonic generation and terahertz emission-
dc.typeArticle-
dc.contributor.affiliatedAuthorKahng, S. J.-
dc.identifier.doi10.1063/1.4941420-
dc.identifier.scopusid2-s2.0-84957101013-
dc.identifier.wosid000373055700022-
dc.identifier.bibliographicCitationAPPLIED PHYSICS LETTERS, v.108, no.5-
dc.relation.isPartOfAPPLIED PHYSICS LETTERS-
dc.citation.titleAPPLIED PHYSICS LETTERS-
dc.citation.volume108-
dc.citation.number5-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusTOPOLOGICAL INSULATOR BI2SE3-
dc.subject.keywordPlusQUANTUM-
dc.subject.keywordPlusBI2TE3-
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