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Al-doped ZnO/Ag/Al-doped ZnO multilayer films with a high figure of merit

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dc.contributor.authorKim, Jun Ho-
dc.contributor.authorMoon, Yoon-Jong-
dc.contributor.authorKim, Sun-Kyung-
dc.contributor.authorYoo, Young-Zo-
dc.contributor.authorSeong, Tae-Yeon-
dc.date.accessioned2021-09-04T09:56:46Z-
dc.date.available2021-09-04T09:56:46Z-
dc.date.created2021-06-18-
dc.date.issued2015-12-
dc.identifier.issn0272-8842-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/91679-
dc.description.abstractIn this study, we investigated the effects of the Al-doped ZnO (AZO)-layer thickness on the optical and electrical properties of AZO/Ag/AZO multilayer films deposited on glass substrates at room temperature. The optimal AZO/Ag/AZO (36 nm/19 nm/36 nm) multilayer sample exhibited a transmittance of approximately 93% at 550 nm. As the AZO-layer thickness increased from 9 to 45 nm, the carrier concentration gradually decreased from 1.87 x 10(22) to 6.36 x 10(21) cm(-3), while the sheet resistance slightly increased from 3.86 to 4.47 Omega sq(-1) and the charge mobility increased from 24.15 to 25.42 cm(2) V-1 s(-1). The samples had smooth surfaces with a root mean square (RMS) roughness ranging from 0.40 to 1.23 am. The Haacke figure of merit (FOM) was calculated for the samples as a function of the AZO-layer thickness. The optimal AZO/Ag/AZO multilayer film had the highest FOM of 99.9 x 10(-3) Omega(-1). (C) 2015 Elsevier Ltd and Techna Group S.r.l. All rights reserved.-
dc.languageEnglish-
dc.language.isoen-
dc.publisherELSEVIER SCI LTD-
dc.subjectTRANSPARENT CONDUCTING OXIDES-
dc.subjectELECTRICAL-PROPERTIES-
dc.subjectELECTRODE-
dc.subjectDESIGN-
dc.subjectLAYER-
dc.subjectANODE-
dc.titleAl-doped ZnO/Ag/Al-doped ZnO multilayer films with a high figure of merit-
dc.typeArticle-
dc.contributor.affiliatedAuthorSeong, Tae-Yeon-
dc.identifier.doi10.1016/j.ceramint.2015.08.001-
dc.identifier.scopusid2-s2.0-84955401605-
dc.identifier.wosid000362919900114-
dc.identifier.bibliographicCitationCERAMICS INTERNATIONAL, v.41, no.10, pp.14805 - 14810-
dc.relation.isPartOfCERAMICS INTERNATIONAL-
dc.citation.titleCERAMICS INTERNATIONAL-
dc.citation.volume41-
dc.citation.number10-
dc.citation.startPage14805-
dc.citation.endPage14810-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalWebOfScienceCategoryMaterials Science, Ceramics-
dc.subject.keywordPlusTRANSPARENT CONDUCTING OXIDES-
dc.subject.keywordPlusELECTRICAL-PROPERTIES-
dc.subject.keywordPlusELECTRODE-
dc.subject.keywordPlusDESIGN-
dc.subject.keywordPlusLAYER-
dc.subject.keywordPlusANODE-
dc.subject.keywordAuthorAl-doped ZnO-
dc.subject.keywordAuthorAg-
dc.subject.keywordAuthorMultilayer film-
dc.subject.keywordAuthorTransparent conducting electrode-
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공과대학 (신소재공학부)
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