Feasibility study of solvent recycle process in spin-on hard mask material manufacturing system
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Jeong, Hyun Jae | - |
dc.contributor.author | Park, Kiho | - |
dc.contributor.author | Yang, Dae Ryook | - |
dc.date.accessioned | 2021-09-04T10:20:22Z | - |
dc.date.available | 2021-09-04T10:20:22Z | - |
dc.date.created | 2021-06-18 | - |
dc.date.issued | 2015-12 | - |
dc.identifier.issn | 0256-1115 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/91852 | - |
dc.description.abstract | The spin-on hard mask material for photo resist in semiconductor industry is usually obtained from a small-scale batch process. To obtain high purity products requires multiple-step purification processes, during which a large amount of organic solvent waste is emitted. In this study, a process for regenerating high purity solvent was proposed and the economic efficiency of the proposed process was analyzed. Also, a sensitivity analysis was performed to analyze the changing economics regarding the main variables. From the analysis, the break-even point can be achieved within one year for different cases considered. On the basis of 4-year operation, the profit margins for each case were determined and compared. It is concluded that the waste solvent regeneration process for spin-on hard mask material production in semiconductor industry is feasible and recommended. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | KOREAN INSTITUTE CHEMICAL ENGINEERS | - |
dc.title | Feasibility study of solvent recycle process in spin-on hard mask material manufacturing system | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Yang, Dae Ryook | - |
dc.identifier.doi | 10.1007/s11814-015-0093-z | - |
dc.identifier.scopusid | 2-s2.0-84949320571 | - |
dc.identifier.wosid | 000365691800002 | - |
dc.identifier.bibliographicCitation | KOREAN JOURNAL OF CHEMICAL ENGINEERING, v.32, no.12, pp.2375 - 2383 | - |
dc.relation.isPartOf | KOREAN JOURNAL OF CHEMICAL ENGINEERING | - |
dc.citation.title | KOREAN JOURNAL OF CHEMICAL ENGINEERING | - |
dc.citation.volume | 32 | - |
dc.citation.number | 12 | - |
dc.citation.startPage | 2375 | - |
dc.citation.endPage | 2383 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.identifier.kciid | ART002049011 | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.description.journalRegisteredClass | kci | - |
dc.relation.journalResearchArea | Chemistry | - |
dc.relation.journalResearchArea | Engineering | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Engineering, Chemical | - |
dc.subject.keywordAuthor | Spin-on Hard Mask Material | - |
dc.subject.keywordAuthor | Regeneration | - |
dc.subject.keywordAuthor | Economic Analysis | - |
dc.subject.keywordAuthor | Sensitivity Analysis | - |
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