Multipoint Force Feedback" Leveling of Massively Parallel Tip Arrays in Scanning Probe Lithography
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Noh, Hanaul | - |
dc.contributor.author | Jung, Goo-Eun | - |
dc.contributor.author | Kim, Sukhyun | - |
dc.contributor.author | Yun, Seong-Hun | - |
dc.contributor.author | Jo, Ahjin | - |
dc.contributor.author | Kahng, Se-Jong | - |
dc.contributor.author | Cho, Nam-Joon | - |
dc.contributor.author | Cho, Sang-Joon | - |
dc.date.accessioned | 2021-09-04T12:37:03Z | - |
dc.date.available | 2021-09-04T12:37:03Z | - |
dc.date.created | 2021-06-18 | - |
dc.date.issued | 2015-09-16 | - |
dc.identifier.issn | 1613-6810 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/92462 | - |
dc.description.abstract | Nanoscale patterning with massively parallel 2D array tips is of significant interest in scanning probe lithography. A challenging task for tip-based large area nanolithography is maintaining parallel tip arrays at the same contact point with a sample substrate in order to pattern a uniform array. Here, polymer pen lithography is demonstrated with a novel leveling method to account for the magnitude and direction of the total applied force of tip arrays by a multipoint force sensing structure integrated into the tip holder. This high-precision approach results in a 0.001 degrees slope of feature edge length variation over 1 cm wide tip arrays. The position sensitive leveling operates in a fully automated manner and is applicable to recently developed scanning probe lithography techniques of various kinds which can enable desktop nanofabrication. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | WILEY-V C H VERLAG GMBH | - |
dc.subject | POLYMER-PEN LITHOGRAPHY | - |
dc.subject | NANOLITHOGRAPHY | - |
dc.title | Multipoint Force Feedback" Leveling of Massively Parallel Tip Arrays in Scanning Probe Lithography | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Kahng, Se-Jong | - |
dc.identifier.doi | 10.1002/smll.201403736 | - |
dc.identifier.scopusid | 2-s2.0-84941316055 | - |
dc.identifier.wosid | 000361189700013 | - |
dc.identifier.bibliographicCitation | SMALL, v.11, no.35, pp.4526 - 4531 | - |
dc.relation.isPartOf | SMALL | - |
dc.citation.title | SMALL | - |
dc.citation.volume | 11 | - |
dc.citation.number | 35 | - |
dc.citation.startPage | 4526 | - |
dc.citation.endPage | 4531 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Chemistry | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Physical | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
dc.subject.keywordPlus | POLYMER-PEN LITHOGRAPHY | - |
dc.subject.keywordPlus | NANOLITHOGRAPHY | - |
dc.subject.keywordAuthor | dip pen nanolithography | - |
dc.subject.keywordAuthor | leveling | - |
dc.subject.keywordAuthor | polymer pen lithography | - |
dc.subject.keywordAuthor | scanning probe lithography | - |
dc.subject.keywordAuthor | lithography | - |
dc.subject.keywordAuthor | tip arrays | - |
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