In Situ Nanolithography with Sub-10 nm Resolution Realized by Thermally Assisted Spin-Casting of a Self-Assembling Polymer
DC Field | Value | Language |
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dc.contributor.author | Lee, Jung Hye | - |
dc.contributor.author | Kim, YongJoo | - |
dc.contributor.author | Cho, Joong-Yeon | - |
dc.contributor.author | Yang, Se Ryeun | - |
dc.contributor.author | Kim, Jong Min | - |
dc.contributor.author | Yim, Soonmin | - |
dc.contributor.author | Lee, Heon | - |
dc.contributor.author | Jung, Yeon Sik | - |
dc.date.accessioned | 2021-09-04T12:47:25Z | - |
dc.date.available | 2021-09-04T12:47:25Z | - |
dc.date.created | 2021-06-18 | - |
dc.date.issued | 2015-09-02 | - |
dc.identifier.issn | 0935-9648 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/92511 | - |
dc.description.abstract | In situ nanolithography is realized based on warm spin-casting of block copolymer solutions. This advancement is based on Si-containing block copolymers with an appropriate thermodynamic driving force for spontaneous phase-separation combined with the thermal assistance provided by slight temperature elevations during the spin-casting. Sub-10 nm half-pitch nanoscale patterns are produced within 30 s without a separate annealing process. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | WILEY-V C H VERLAG GMBH | - |
dc.subject | BLOCK-COPOLYMERS | - |
dc.subject | IMPRINT LITHOGRAPHY | - |
dc.subject | ARRAYS | - |
dc.subject | GRAPHOEPITAXY | - |
dc.subject | NANOSTRUCTURES | - |
dc.subject | POLYSTYRENE | - |
dc.subject | ORIENTATION | - |
dc.subject | TEMPERATURE | - |
dc.subject | PATTERNS | - |
dc.subject | PHASE | - |
dc.title | In Situ Nanolithography with Sub-10 nm Resolution Realized by Thermally Assisted Spin-Casting of a Self-Assembling Polymer | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Lee, Heon | - |
dc.identifier.doi | 10.1002/adma.201501363 | - |
dc.identifier.scopusid | 2-s2.0-84940666281 | - |
dc.identifier.wosid | 000360721600001 | - |
dc.identifier.bibliographicCitation | ADVANCED MATERIALS, v.27, no.33, pp.4814 - 4822 | - |
dc.relation.isPartOf | ADVANCED MATERIALS | - |
dc.citation.title | ADVANCED MATERIALS | - |
dc.citation.volume | 27 | - |
dc.citation.number | 33 | - |
dc.citation.startPage | 4814 | - |
dc.citation.endPage | 4822 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Chemistry | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Physical | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
dc.subject.keywordPlus | BLOCK-COPOLYMERS | - |
dc.subject.keywordPlus | IMPRINT LITHOGRAPHY | - |
dc.subject.keywordPlus | ARRAYS | - |
dc.subject.keywordPlus | GRAPHOEPITAXY | - |
dc.subject.keywordPlus | NANOSTRUCTURES | - |
dc.subject.keywordPlus | POLYSTYRENE | - |
dc.subject.keywordPlus | ORIENTATION | - |
dc.subject.keywordPlus | TEMPERATURE | - |
dc.subject.keywordPlus | PATTERNS | - |
dc.subject.keywordPlus | PHASE | - |
dc.subject.keywordAuthor | block copolymers | - |
dc.subject.keywordAuthor | directed self-assembly | - |
dc.subject.keywordAuthor | sub-10 nm | - |
dc.subject.keywordAuthor | warm spin-casting | - |
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