High-throughput patterning of photonic structures with tunable periodicity
DC Field | Value | Language |
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dc.contributor.author | Kempa, Thomas J. | - |
dc.contributor.author | Bediako, D. Kwabena | - |
dc.contributor.author | Kim, Sun-Kyung | - |
dc.contributor.author | Park, Hong-Gyu | - |
dc.contributor.author | Nocera, Daniel G. | - |
dc.date.accessioned | 2021-09-04T16:58:07Z | - |
dc.date.available | 2021-09-04T16:58:07Z | - |
dc.date.created | 2021-06-18 | - |
dc.date.issued | 2015-04-28 | - |
dc.identifier.issn | 0027-8424 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/93813 | - |
dc.description.abstract | A patterning method termed "RIPPLE" (reactive interface patterning promoted by lithographic electrochemistry) is applied to the fabrication of arrays of dielectric and metallic optical elements. This method uses cyclic voltammetry to impart patterns onto the working electrode of a standard three-electrode electrochemical setup. Using this technique and a template stripping process, periodic arrays of Ag circular Bragg gratings are patterned in a high-throughput fashion over large substrate areas. By varying the scan rate of the cyclically applied voltage ramps, the periodicity of the gratings can be tuned in situ over micrometer and submicrometer length scales. Characterization of the periodic arrays of periodic gratings identified point-like and annular scattering modes at different planes above the structured surface. Facile, reliable, and rapid patterning techniques like RIPPLE may enable the high-throughput and low-cost fabrication of photonic elements and metasurfaces for energy conversion and sensing applications. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | NATL ACAD SCIENCES | - |
dc.subject | PEN LITHOGRAPHY | - |
dc.subject | PLASMONICS | - |
dc.subject | NANOTECHNOLOGY | - |
dc.subject | METALS | - |
dc.title | High-throughput patterning of photonic structures with tunable periodicity | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Park, Hong-Gyu | - |
dc.identifier.doi | 10.1073/pnas.1504280112 | - |
dc.identifier.scopusid | 2-s2.0-84928534383 | - |
dc.identifier.wosid | 000353554000035 | - |
dc.identifier.bibliographicCitation | PROCEEDINGS OF THE NATIONAL ACADEMY OF SCIENCES OF THE UNITED STATES OF AMERICA, v.112, no.17, pp.5309 - 5313 | - |
dc.relation.isPartOf | PROCEEDINGS OF THE NATIONAL ACADEMY OF SCIENCES OF THE UNITED STATES OF AMERICA | - |
dc.citation.title | PROCEEDINGS OF THE NATIONAL ACADEMY OF SCIENCES OF THE UNITED STATES OF AMERICA | - |
dc.citation.volume | 112 | - |
dc.citation.number | 17 | - |
dc.citation.startPage | 5309 | - |
dc.citation.endPage | 5313 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalWebOfScienceCategory | Multidisciplinary Sciences | - |
dc.subject.keywordPlus | PEN LITHOGRAPHY | - |
dc.subject.keywordPlus | PLASMONICS | - |
dc.subject.keywordPlus | NANOTECHNOLOGY | - |
dc.subject.keywordPlus | METALS | - |
dc.subject.keywordAuthor | nanopattern | - |
dc.subject.keywordAuthor | electrochemistry | - |
dc.subject.keywordAuthor | photonics | - |
dc.subject.keywordAuthor | silicon | - |
dc.subject.keywordAuthor | nanofabrication | - |
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