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Optimizing n-type contact design and chip size for high-performance indium gallium nitride/gallium nitride-based thin-film vertical light-emitting diode

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dc.contributor.authorHan, Jaecheon-
dc.contributor.authorLee, Daehee-
dc.contributor.authorJin, Boram-
dc.contributor.authorJeong, Hwanhee-
dc.contributor.authorSong, June-O-
dc.contributor.authorSeong, Tae-Yeon-
dc.date.accessioned2021-09-04T18:40:26Z-
dc.date.available2021-09-04T18:40:26Z-
dc.date.created2021-06-15-
dc.date.issued2015-03-
dc.identifier.issn1369-8001-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/94263-
dc.description.abstractThe effects of the n-contact design and chip size on the electrical, optical and thermal characteristics of thin-film vertical light-emitting diodes (VLEDs) were investigated to optimize GaN-based LED performance for solid-state lighting applications. For the small (chip size: 1000 x 1000 mu m(2)) and large (1450 x 1450 mu m(2)) VLEDs, the forward bias voltages are decreased from 322 to 3.12 V at 350 mA and from 3.44 to 3.16 Vat 700 mA, respectively, as the number of n-contact via holes is increased. The small LEDs give maximum output powers of 651.0-675.4 mW at a drive current of 350 mA, while the large VLEDs show the light output powers in the range 1356.7-1380.2 mW, 700 mA, With increasing drive current, the small chips go through more severe degradation in the wall-plug efficiency than the large chips. The small chips give the junction temperatures in the range 51.1-57.2 degrees C at 350 mA, while the large chips show the junction temperatures of 83.1-93.0 degrees C at 700 mA, The small LED chips exhibit lower junction temperatures when equipped with more n-contact via holes. (C) 2014 Elsevier Ltd. All rights reserved.-
dc.languageEnglish-
dc.language.isoen-
dc.publisherELSEVIER SCI LTD-
dc.subjectFABRICATION-
dc.titleOptimizing n-type contact design and chip size for high-performance indium gallium nitride/gallium nitride-based thin-film vertical light-emitting diode-
dc.typeArticle-
dc.contributor.affiliatedAuthorSeong, Tae-Yeon-
dc.identifier.doi10.1016/j.mssp.2014.11.038-
dc.identifier.scopusid2-s2.0-84916887447-
dc.identifier.wosid000350513500021-
dc.identifier.bibliographicCitationMATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, v.31, pp.153 - 159-
dc.relation.isPartOfMATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING-
dc.citation.titleMATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING-
dc.citation.volume31-
dc.citation.startPage153-
dc.citation.endPage159-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalWebOfScienceCategoryPhysics, Condensed Matter-
dc.subject.keywordPlusFABRICATION-
dc.subject.keywordAuthorVertical LED-
dc.subject.keywordAuthorVia hole-
dc.subject.keywordAuthorGaN-
dc.subject.keywordAuthorOhmic contact-
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공과대학 (신소재공학부)
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