Atomic layer deposition of ruthenium on plasma-treated vertically aligned carbon nanotubes for high-performance ultracapacitors
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, Jun Woo | - |
dc.contributor.author | Kim, Byungwoo | - |
dc.contributor.author | Park, Suk Won | - |
dc.contributor.author | Kim, Woong | - |
dc.contributor.author | Shim, Joon Hyung | - |
dc.date.accessioned | 2021-09-05T03:49:02Z | - |
dc.date.available | 2021-09-05T03:49:02Z | - |
dc.date.created | 2021-06-15 | - |
dc.date.issued | 2014-10-31 | - |
dc.identifier.issn | 0957-4484 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/97041 | - |
dc.description.abstract | It is challenging to realize a conformal metal coating by atomic layer deposition (ALD) because of the high surface energy of metals. In this study, ALD of ruthenium (Ru) on vertically aligned carbon nanotubes (CNTs) was carried out. To activate the surface of CNTs that lack surface functional groups essential for ALD, oxygen plasma was applied ex situ before ALD. X-ray photoelectron spectroscopy and Raman spectroscopy confirmed surface activation of CNTs by the plasma pretreatment. Transmission electron microscopy analysis with energy-dispersive x-ray spectroscopy composition mapping showed that ALD Ru grew conformally along CNTs walls. ALD Ru/CNTs were electrochemically oxidized to ruthenium oxide (RuOx) that can be a potentially useful candidate for use in the electrodes of ultracapacitors. Electrode performance of RuOx/CNTs was evaluated using cyclic voltammetry and galvanostatic charge-discharge measurements. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | IOP PUBLISHING LTD | - |
dc.subject | THIN-FILMS | - |
dc.subject | OXIDE | - |
dc.subject | NANOPARTICLES | - |
dc.subject | ELECTRODEPOSITION | - |
dc.subject | DIELECTRICS | - |
dc.subject | CAPACITORS | - |
dc.subject | ENERGY | - |
dc.subject | ALD | - |
dc.title | Atomic layer deposition of ruthenium on plasma-treated vertically aligned carbon nanotubes for high-performance ultracapacitors | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Kim, Woong | - |
dc.contributor.affiliatedAuthor | Shim, Joon Hyung | - |
dc.identifier.doi | 10.1088/0957-4484/25/43/435404 | - |
dc.identifier.scopusid | 2-s2.0-84907901658 | - |
dc.identifier.wosid | 000344159600009 | - |
dc.identifier.bibliographicCitation | NANOTECHNOLOGY, v.25, no.43 | - |
dc.relation.isPartOf | NANOTECHNOLOGY | - |
dc.citation.title | NANOTECHNOLOGY | - |
dc.citation.volume | 25 | - |
dc.citation.number | 43 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.subject.keywordPlus | THIN-FILMS | - |
dc.subject.keywordPlus | OXIDE | - |
dc.subject.keywordPlus | NANOPARTICLES | - |
dc.subject.keywordPlus | ELECTRODEPOSITION | - |
dc.subject.keywordPlus | DIELECTRICS | - |
dc.subject.keywordPlus | CAPACITORS | - |
dc.subject.keywordPlus | ENERGY | - |
dc.subject.keywordPlus | ALD | - |
dc.subject.keywordAuthor | carbon nanotubes | - |
dc.subject.keywordAuthor | atomic layer deposition | - |
dc.subject.keywordAuthor | ultracapacitors | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
(02841) 서울특별시 성북구 안암로 14502-3290-1114
COPYRIGHT © 2021 Korea University. All Rights Reserved.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.