Fine luminescent patterning on ZnO nanowires and films using focused electron-beam irradiation

Abstract

ZnO thin films and nanowires (NWs) were precisely treated by focused electron-beam (E-beam) irradiation with a line width between 200 nm and 3 mu m. For both ZnO films and NWs, an increased green emission was clearly observed for the E-beam-treated parts. Using a high-resolution laser confocal microscope, the photoluminescence intensities for E-beam-treated ZnO structures increased with increasing dose 1.0 x 10(17)-1.0 x 10(18) electrons/cm(2). The resistivity of a single ZnO NW increased from 56 to 1800 Omega cm after the E-beam treatment. From the results for the annealed ZnO thin films, we analyzed that the variations in PL and resistivity were due to the formation of vacancies upon focused E-beam irradiation. (C) 2014 Elsevier B.V. All rights reserved.