Fabrication of carbon nanotube emitters on the graphite rod and their high field emission performance
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Sun, Yuning | - |
dc.contributor.author | Song, Yenan | - |
dc.contributor.author | Shin, Dong Hoon | - |
dc.contributor.author | Yun, Ki Nam | - |
dc.contributor.author | Jeon, Seok-Gy | - |
dc.contributor.author | Kim, Jung-Il | - |
dc.contributor.author | Saito, Yahachi | - |
dc.contributor.author | Lee, Cheol Jin | - |
dc.date.accessioned | 2021-09-05T12:05:32Z | - |
dc.date.available | 2021-09-05T12:05:32Z | - |
dc.date.created | 2021-06-15 | - |
dc.date.issued | 2014-01-27 | - |
dc.identifier.issn | 0003-6951 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/99503 | - |
dc.description.abstract | Carbon nanotube (CNT) emitters with small emission area were fabricated on graphite rods using CNT films. By introducing the edge polishing process, the field emission performance of the CNT emitter was much improved, which showed a very high emission current of 6.34mA (1.6 A/cm(2)) under an applied electric field of 5.3V/mu m. It also indicates good long-term emission stability, which reveals no degradation in the emission current for 20 h. The emission patterns demonstrate uniform and well-focused electron beam spots. The enhanced field emission performance is mainly attributed to the suppressed edge emission after the edge polishing process. (C) 2014 AIP Publishing LLC. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | AMER INST PHYSICS | - |
dc.subject | CHEMICAL-VAPOR-DEPOSITION | - |
dc.subject | ELECTRON SOURCES | - |
dc.subject | DISPLAY | - |
dc.subject | DEVICES | - |
dc.subject | YARNS | - |
dc.subject | TIP | - |
dc.title | Fabrication of carbon nanotube emitters on the graphite rod and their high field emission performance | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Shin, Dong Hoon | - |
dc.contributor.affiliatedAuthor | Lee, Cheol Jin | - |
dc.identifier.doi | 10.1063/1.4863415 | - |
dc.identifier.scopusid | 2-s2.0-84893217791 | - |
dc.identifier.wosid | 000331209900065 | - |
dc.identifier.bibliographicCitation | APPLIED PHYSICS LETTERS, v.104, no.4 | - |
dc.relation.isPartOf | APPLIED PHYSICS LETTERS | - |
dc.citation.title | APPLIED PHYSICS LETTERS | - |
dc.citation.volume | 104 | - |
dc.citation.number | 4 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.subject.keywordPlus | CHEMICAL-VAPOR-DEPOSITION | - |
dc.subject.keywordPlus | ELECTRON SOURCES | - |
dc.subject.keywordPlus | DISPLAY | - |
dc.subject.keywordPlus | DEVICES | - |
dc.subject.keywordPlus | YARNS | - |
dc.subject.keywordPlus | TIP | - |
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