Photo-responsive transistors of CVD grown single-layer MoS2 and its nanoscale optical characteristics

  • Park, Hyeon Jung; 
  • Kim, Min Su; 
  • Kim, Jeongyong; 
  • Joo, Jinsoo
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SCOPUS

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초록

The single-layer and multi-layers of MoS2 were grown using the chemical vapor deposition (CVD) method. The structural properties of the MoS2 were investigated through X-ray photoelectron spectroscopy (XPS). The optical characteristics in nanoscale of the MoS2 were determined from the analysis of Raman and photoluminescence (PL) spectra using a high-resolution laser confocal microscope (LCM). Thin-film-transistors (TFTs) using a single-layer MoS2 were fabricated, and the photo-responsive current-voltage (IeV) characteristics of the TFTs were measured with varying intensities of incident light. We observed the increase of both the photo-current and mobility with increasing the intensity of incident light. This is due to the contribution of photo-induced charge carriers from the valance band and trap states. The increasing rate of the photo-current of the TFTs with gate bias (i.e. on state) was considerably higher than that in off state, indicating the gate controlled photo-sensitive transistor. (C) 2016 Elsevier B.V. All rights reserved.

키워드

MoS2; Transistor; Mobility; Photo-responsive; Nanoscale; Photoluminescence; CHEMICAL-VAPOR-DEPOSITION; HEXAGONAL BORON-NITRIDE; LARGE-AREA; ATOMIC LAYERS; GRAPHENE; PHOTOTRANSISTORS; MONOLAYER; HETEROSTRUCTURES; PHOTODETECTOR; FILM
제목
Photo-responsive transistors of CVD grown single-layer MoS2 and its nanoscale optical characteristics
저자
Park, Hyeon Jung; Kim, Min Su; Kim, Jeongyong; Joo, Jinsoo
DOI
10.1016/j.cap.2016.07.006
발행일
2016-10
유형
Article
저널명
Current Applied Physics
권
16
호
10
페이지
1320 ~ 1325