The effect of the stacking fault on the diffusion of chemisorbed hydrogen atoms inside few-layered graphene

  • Chung, Dong Hyen; 
  • Guk, Hyein; 
  • Kim, Deajin; 
  • Han, Sang Soo; 
  • Park, Noejung; 
  • ... Choi, Kihang; 
  • 외 1명
Citations

WEB OF SCIENCE

6
Citations

SCOPUS

6

초록

We examined the diffusion of hydrogen atoms in mono-, bi- and tetralayer graphene with AB stacking and two bilayer graphene with stacking faults using density functional theory. The bi- and tetralayer graphene provide diffusion pathways with lower energy barriers inside the interlayer space. Inside the bi- and tetralayer graphene with AB stacking, the in-plane diffusion is more favorable than the inter-plane jumping. However, the stacking faults made by sliding layer planes lowers the energy barrier of the inter-plane jumping and the effective frequency of the inter-plane jump is larger than that of the in-plane diffusion inside the graphene layers with the stacking faults. This suggests that hydrogen atoms can diffuse over a long distance inside few-layered graphene with stacking faults jumping consecutively between adjacent layers.

키워드

KINETIC-PROPERTIES; GRAPHITE; STATE; SPILLOVER; DYNAMICS; CHEMISTRY; SINGLE; DFT
제목
The effect of the stacking fault on the diffusion of chemisorbed hydrogen atoms inside few-layered graphene
저자
Chung, Dong Hyen; Guk, Hyein; Kim, Deajin; Han, Sang Soo; Park, Noejung; Choi, Kihang; Choi, Seung-Hoon
DOI
10.1039/c3ra46626d
발행일
2014
유형
Article
저널명
RSC Advances
권
4
호
18
페이지
9223 ~ 9228