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The effect of the stacking fault on the diffusion of chemisorbed hydrogen atoms inside few-layered graphene
- Chung, Dong Hyen;
- Guk, Hyein;
- Kim, Deajin;
- Han, Sang Soo;
- Park, Noejung;
- ... Choi, Kihang;
- 외 1명
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6초록
We examined the diffusion of hydrogen atoms in mono-, bi- and tetralayer graphene with AB stacking and two bilayer graphene with stacking faults using density functional theory. The bi- and tetralayer graphene provide diffusion pathways with lower energy barriers inside the interlayer space. Inside the bi- and tetralayer graphene with AB stacking, the in-plane diffusion is more favorable than the inter-plane jumping. However, the stacking faults made by sliding layer planes lowers the energy barrier of the inter-plane jumping and the effective frequency of the inter-plane jump is larger than that of the in-plane diffusion inside the graphene layers with the stacking faults. This suggests that hydrogen atoms can diffuse over a long distance inside few-layered graphene with stacking faults jumping consecutively between adjacent layers.
키워드
- 제목
- The effect of the stacking fault on the diffusion of chemisorbed hydrogen atoms inside few-layered graphene
- 저자
- Chung, Dong Hyen; Guk, Hyein; Kim, Deajin; Han, Sang Soo; Park, Noejung; Choi, Kihang; Choi, Seung-Hoon
- 발행일
- 2014
- 유형
- Article
- 저널명
- RSC Advances
- 권
- 4
- 호
- 18
- 페이지
- 9223 ~ 9228
- 언어
- ENG
- 출판사
- ROYAL SOC CHEMISTRY
- 발행국가
- 영국
- 분량
- 6 페이지
- ISSN
- E 2046-2069
P 2046-2069