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Influence of Oxygen in Copper Containing NH4F solution on Ideally hydrogen Terminated Si(111) surface; Studies by ATR-FTIR

  • Chi-Woo Lee
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Influence of Oxygen in Copper Containing NH4F solution on Ideally hydrogen Terminated Si(111) surface; Studies by ATR-FTIR
저자
Chi-Woo Lee
학회명
KECS

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