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New Approaches for overcoming Current Issues of Plasma Sputtering Process During Organic-electronics Device Fabrication: Plasma Damage Free and Room Temperature Process for High Quality Metal Oxide Thin Film
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- New Approaches for overcoming Current Issues of Plasma Sputtering Process During Organic-electronics Device Fabrication: Plasma Damage Free and Room Temperature Process for High Quality Metal Oxide Thin Film
- 저자
- Hong MunPyo
- 발행일
- 2012-02-09
- 학회명
- 제42회 동계학술대회
- 개최지
- 보광휘닉스파크(강원도평창)
- 개최국가
- 대한민국
- 학회 개최일
- 2012-02-08 ~ 2012-02-10