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In Situ Nanolithography with Sub-10 nm Resolution Realized by Thermally Assisted Spin-Casting of a Self-Assembling Polymer
- Lee, Jung Hye;
- Kim, YongJoo;
- Cho, Joong-Yeon;
- Yang, Se Ryeun;
- Kim, Jong Min;
- ... Lee, Heon;
- 외 2명
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22초록
In situ nanolithography is realized based on warm spin-casting of block copolymer solutions. This advancement is based on Si-containing block copolymers with an appropriate thermodynamic driving force for spontaneous phase-separation combined with the thermal assistance provided by slight temperature elevations during the spin-casting. Sub-10 nm half-pitch nanoscale patterns are produced within 30 s without a separate annealing process.
키워드
block copolymers; directed self-assembly; sub-10 nm; warm spin-casting; BLOCK-COPOLYMERS; IMPRINT LITHOGRAPHY; ARRAYS; GRAPHOEPITAXY; NANOSTRUCTURES; POLYSTYRENE; ORIENTATION; TEMPERATURE; PATTERNS; PHASE
- 제목
- In Situ Nanolithography with Sub-10 nm Resolution Realized by Thermally Assisted Spin-Casting of a Self-Assembling Polymer
- 저자
- Lee, Jung Hye; Kim, YongJoo; Cho, Joong-Yeon; Yang, Se Ryeun; Kim, Jong Min; Yim, Soonmin; Lee, Heon; Jung, Yeon Sik
- 발행일
- 2015-09-02
- 유형
- Article
- 권
- 27
- 호
- 33
- 페이지
- 4814 ~ 4822
- 언어
- ENG
- 출판사
- WILEY-V C H VERLAG GMBH
- 발행국가
- 독일
- 분량
- 9 페이지
- ISSN
- E 1521-4095
P 0935-9648