Characteristics of Amorphous Tungsten Nitride Diffusion Barrier for Metal-Organic Chemical Vapor deposited Cu Metallization

  • Kim Yong Tae
제목
Characteristics of Amorphous Tungsten Nitride Diffusion Barrier for Metal-Organic Chemical Vapor deposited Cu Metallization
저자
Kim Yong Tae
발행일
1994-07-01
학회명
1994 Int'l Electron Devices and Materials Symp