Combined Laser Interference and Photolithography Patterning of a Hybrid Mask Mold for Nanoimprint Lithography

초록

A lithography technique that combines laser interference lithography (LIL) and photolithography, which can be a valuable technique for the low cost production of microscale and nanoscale hybrid mask molds, is proposed. LIL is a maskless process which allows the production of periodic nanoscale structures quickly, uniformly, and over large areas. A 257 nm wavelength Ar-Ion laser is utilized for the LIL process incorporating a Lloyd's mirror one beam inteferometer. By combining LIL with photolithography, the non-selective patterning limitation of LIL are explored and the design and development of a hybrid mask mold for nanoimprint lithography process, with uniform two-dimensional nanoscale patterns are presented. Polydimethylsiloxane is applied on the mold to fabricate a replica of the stamp. Through nanoimprint lithography using the manufactured replica, successful transfer of the patterns is achieved, and selective nanoscale patterning is confirmed with pattern sizes of around 180 nm and pattern aspect ratio of around 1.44:1.

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