Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns

Bang, Joona; Jeong, Unyong; Ryu, Du Yeol; Russell, Thomas P.; Hawker, Craig J.

doi:10.1002/adma.200803302

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Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns

Bang, Joona;
Jeong, Unyong;
Ryu, Du Yeol;
Russell, Thomas P.;
Hawker, Craig J.

Citations

WEB OF SCIENCE

650

Citations

SCOPUS

671

초록

The self-asembly of block copolymers is a promising platform for the "bottom-up" fabrication of nanostructured materials and devices. This review covers some of the advances made in this field from the laboratory setting to applications where block copolymers are in use.

키워드

SYMMETRIC DIBLOCK COPOLYMER; ELECTRIC-FIELD ALIGNMENT; POLYSTYRENE-BLOCK-POLY(ETHYLENE OXIDE) MICELLES; SURFACE-INDUCED ORIENTATION; NANOPOROUS THIN-FILMS; NOBLE-METAL COLLOIDS; SINGLE-LAYER FILMS; LONG-RANGE ORDER; PS-B-PMMA; MICRODOMAIN ORIENTATION

제목: Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns

저자: Bang, Joona; Jeong, Unyong; Ryu, Du Yeol; Russell, Thomas P.; Hawker, Craig J.

DOI: 10.1002/adma.200803302

발행일: 2009-12-18

유형: Review

저널명: Advanced Materials

권: 21

호: 47

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