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- 제목
- Effects of Concentration of Copper and Oxygen on Electroless Deposition of Copper on Hydrogen-Terminated Si(111) Surface in NH4F Solution Containing
- 저자
- Chi-Woo Lee
- 학회명
- 205th Meeting of the Electrochemical Society
- 개최지
- 미국(샌안토니오)
- 학회 개최일
- 2004-05-09 ~ 2004-05-13