Resistive switching characteristics of polycrystalline SrTiO3 films

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16
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SCOPUS

13

초록

Strontium titanate (STO) thin films 90 nm in thickness were grown on a Pt substrate through atomic layer deposition (ALD). The as-deposited ALD STO grown with an ALD cycle ratio of 1:1 (Sr:Ti) was in an amorphous phase, and annealing at 800 degrees C in air crystallized the films into the perovskite phase. This phase change was confirmed by x-ray diffraction and transmission electron microscopy. The as-deposited ALD STO exhibited no discernible switching mechanism, whereas unipolar switching behavior was reproducibly observed with a high resistance ratio (10(8)-10(9)) and strict separation of the set/reset voltages and currents in the annealed ALD STO. Mechanisms for charge transport in both the low- and high-resistance states and for resistive switching in the annealed ALD STO are also proposed. (C) 2014 AIP Publishing LLC.

키워드

ATOMIC LAYER DEPOSITION; THIN-FILMS; RESISTANCE
제목
Resistive switching characteristics of polycrystalline SrTiO3 films
저자
Choi, Hyung Jong; Park, Suk Won; Han, Gwon Deok; Na, Junhong; Kim, Gyu-Tae; Shim, Joon Hyung
DOI
10.1063/1.4883646
발행일
2014-06-16
유형
Article
저널명
Applied Physics Letters
권
104
호
24