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A fabrication technique of top-gate nanowire FETs by a photolithography process
- 제목
- A fabrication technique of top-gate nanowire FETs by a photolithography process
- 저자
- Kim, Sangsig
- 학회명
- Mirco- and Nano- Engineering 2006, 32nd International conference
- 개최지
- Barcelona
- 개최국가
- 스페인
- 학회 개최일
- 2006-09-17 ~ 2006-09-20