Growth of amorphous silica nanowires using nickel silicide catalyst by a thermal annealing process

초록

We report on the growth of NiSi2-catalyzed amorphous SiO2 nanowires by rapid-thermal-annealing of Ni (40 nm)/poly-Si(60 nm)/SiO2(110 nm)/undoped Si substrate structures at 900 degrees C in N-2 ambient. The diameter of the nanowires is dependent on the diameter of the NiSi2 catalyst particles; the former is about 16-45% smaller than the later. Considering the presence of the nanoparticles located at the tip of the nanowires, the growth behavior of the a-SiO2 nanowires is described in terms of the generation of SiO vapor and the VLS mechanism. (C) 2010 Elsevier B. V. All rights reserved.

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