Fabrication of Sub-100 nm Sized Patterns on Curved Acryl Substrate Using a Flexible Stamp

  • Hong, Sung-Hoon
  • Han, Kang-Soo
  • Byeon, Kyeong-Jae
  • Lee, Heon
  • Choi, Kyung-Woo
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초록

As small as 100nm patterns were successfully transferred onto a non-planar acryl substrate using both UV nanoimprinting and hot embossing techniques. Two different types of flexible imprint stamps, electroformed nickel foil stamp and molded water soluble poly(vinyl alcohol) (PVA) stamp, were used. 100 nm line and space pattern of Si master was successfully transferred to nickel foil stamp and PVA stamp and their patterns were also transferred to the surface of curved acryl substrate using either UV nanoimprint lithography or hot embossing lithography. [DOI: 10.1143/JJAP.47.3699]

키워드

curved substrateflexible stampnickel foil stamphot embossingnanoimprintIMPRINT LITHOGRAPHYNANOIMPRINT LITHOGRAPHYTEMPLATEMOLD
제목
Fabrication of Sub-100 nm Sized Patterns on Curved Acryl Substrate Using a Flexible Stamp
저자
Hong, Sung-HoonHan, Kang-SooByeon, Kyeong-JaeLee, HeonChoi, Kyung-Woo
DOI
10.1143/JJAP.47.3699
발행일
2008-05
유형
Article
저널명
Japanese Journal of Applied Physics
47
5
페이지
3699 ~ 3701