Fabrication of roll imprint stamp for continuous UV roll imprinting process

  • Hwang, Seon-Yong
  • Hong, Sung-Hoon
  • Jung, Ho-Yong
  • Lee, Heon
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초록

Recently, nano imprint lithography has been developed for mass production of nano-scale patterns on large-scale substrates. To achieve high throughput and cost reduction, roll-to-roll imprint lithography has been introduced. The roll-to-roll imprint is the suitable process for large area patterning, especially, flexible substrates for display devices. In this study, roll-to-roll imprint stamp is fabricated using polyvinyl alcohol (PVA) mold and UV curable poly-dimethylsiloxanes (PDMS) resin for continuous roll imprinting process. The PVA mold was chosen since it is flexible and can be dissolved in water. Since the PDMS can form thin SiOx layer on the surface by oxygen plasma treatment, silane based hydrophobic anti-stiction layer can be formed directly on the surface of PDMS. As a result, nano-sized patterns were successfully formed on the flexible PET films by UV roll imprinting with the fabricated roll stamp. (C) 2008 Elsevier B.V. All rights reserved.

키워드

Roll-to-Roll imprintRoll stampM-PDMS (Methacryloxypropyl terminated poly-dimethylsiloxanes)PVA (poly-vinyl alcohol)Nano imprint lithographyNM HALF-PITCHNANOIMPRINT LITHOGRAPHYSUBSTRATERESIN
제목
Fabrication of roll imprint stamp for continuous UV roll imprinting process
저자
Hwang, Seon-YongHong, Sung-HoonJung, Ho-YongLee, Heon
DOI
10.1016/j.mee.2008.11.055
발행일
2009-04
유형
Article; Proceedings Paper
저널명
Microelectronic Engineering
86
4-6
페이지
642 ~ 645