Nondestructive Readout Memory Characteristics of Silicon Nanowire Biristors

  • Lim, Doohyeok; 
  • Kim, Minsuk; 
  • Kim, Yoonjoong; 
  • Cho, Jinsun; 
  • Kim, Sangsig
Citations

WEB OF SCIENCE

9
Citations

SCOPUS

10

초록

In this paper, we demonstrate nondestructive readout memory characteristics of a bistable resistor (biristor) with an n(+)-p-n(+) Si nanowire (SiNW) channel on a bendable substrate. The SiNW channel is fabricated using a top-down route, which is compatible with the current complementary metal-oxide-semiconductor technology. The SiNW biristor shows the outstanding memory characteristics such as a retention time of 10 s and a current sensing margin of similar to 23-mu A at room temperature. These memory characteristics originate from a positive feedback process resulting from impact ionization near the p-n junction. Moreover, the positive feedback mechanism is comprehensively investigated using device simulation.

키워드

Bistable resistor (biristor); capacitor-less; one-transistor dynamic random access memory (1T-DRAM); positive feedback; silicon nanowire (SiNW); SOI MOSFETS; BIPOLAR-TRANSISTORS; BISTABLE RESISTOR; 1T-DRAM; OPERATION; BREAKDOWN; CELL
제목
Nondestructive Readout Memory Characteristics of Silicon Nanowire Biristors
저자
Lim, Doohyeok; Kim, Minsuk; Kim, Yoonjoong; Cho, Jinsun; Kim, Sangsig
DOI
10.1109/TED.2018.2802492
발행일
2018-04
유형
Article
저널명
IEEE Transactions on Electron Devices
권
65
호
4
페이지
1578 ~ 1582