High-resolution infrared quantum dot photodiode Array via aerosol-assisted deposition

초록

Colloidal quantum dots (CQDs) with tunable bandgaps and high absorption coefficients hold great potential for infrared photodetectors. However, the lack of pixelization technologies that preserve their sensitive surface chemistry hinders their integration into practical devices. This paper introduces a direct patterning technique for highly integrated CQD optoelectronics, wherein lead sulfide CQDs (PbS CQDs) are solidified using an aerosolassisted deposition (AAD) system. The AAD process involves depositing aerosolized CQDs onto a substrate, enabling the formation of thin films with minimal limitations on both area and thickness. Additionally, its mask compatibility enables efficient direct patterning, eliminating the complex process flow and performance degradation associated with conventional techniques such as photolithography. This AAD-based direct patterning enables the one-step fabrication of a highly integrated PbS CQD photodiode array with 268 pixels per inch (single pixel area = 50 x 50 mu m2), demonstrating significant potential for infrared imaging applications.

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