Degradation pattern of SnO2 nanowire field effect transistors

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초록

The degradation pattern of SnO2 nanowire field effect transistors (FETs) was investigated by using an individual SnO2 nanowire that was passivated in sections by either a PMMA (polymethylmethacrylate) or an Al2O3 layer. The PMMA passivated section showed the best mobility performance with a significant positive shift in the threshold voltage. The distinctive two-dimensional R-s-mu diagram based on a serial resistor connected FET model suggested that this would be a useful tool for evaluating the efficiency for post-treatments that would improve the device performance of a single nanowire transistor.

키워드

degradationSnO2 nanowireSCHOTTKY BARRIERSOPTIMIZATIONEMISSION
제목
Degradation pattern of SnO2 nanowire field effect transistors
저자
Na, JunhongHuh, JunghwanPark, Sung Chankim, DaeIlKim, Dong WookLee, Jae WooHwang, In-SungLee, Jong-HeunHa, Jeong SookKim, Gyu Tae
DOI
10.1088/0957-4484/21/48/485201
발행일
2010-12-03
유형
Article
저널명
Nanotechnology
21
48