Large-Scale Graphene Micropatterns via Self-Assembly-Mediated Process for Flexible Device Application

  • Kim, TaeYoung
  • Kirn, Hyeongkeun
  • Kwon, Soon Woo
  • Kim, Yena
  • Park, Won Kyu
  • 외 5명
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71

초록

We report on a method for the large-scale production of graphene micropatterns by a self-assembly mediated process. The evaporation-induced self-assembly technique was engineered to produce highly ordered graphene patterns on flexible substrates in a simplified and scalable manner. The crossed stripe graphene patterns have been produced over a large area with regions consisting of single- and two-layer graphene. Based on these graphene patterns, flexible graphene-based field effect transistors have been fabricated with an ion-gel gate dielectric, which operates at low voltages of < 2 V with a hole and electron mobility of 214 and 106 cm(2)/V.s, respectively. The self-assembly approach described here may pave the way for the nonlithographic production of graphene patterns, which is scalable to large areas and compatible with roll-to-roll system.

키워드

Grapheneself-assemblypatterninglarge-areaflexible electronicsfield effect transistorFIELD-EFFECT TRANSISTORSGEL GATE DIELECTRICSCONTROLLED EVAPORATIONRAMAN-SPECTROSCOPYLOW-VOLTAGELAYERFILMSFLOWGAS
제목
Large-Scale Graphene Micropatterns via Self-Assembly-Mediated Process for Flexible Device Application
저자
Kim, TaeYoungKirn, HyeongkeunKwon, Soon WooKim, YenaPark, Won KyuYoon, Dae HoJang, A-RangShin, Hyeon SukSuh, Kwang S.Yang, Woo Seok
DOI
10.1021/nl203691d
발행일
2012-02
유형
Article
저널명
Nano Letters
12
2
페이지
743 ~ 748