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Effect of plasma pretreatment on the direction in a chemical vapor deposition of copper using Cu(dmamb)2
Effect of plasma pretreatment on the direction in a chemical vapor deposition of copper using Cu(dmamb)2
- 제목
- Effect of plasma pretreatment on the direction in a chemical vapor deposition of copper using Cu(dmamb)2
- 제목 (타언어)
- Effect of plasma pretreatment on the direction in a chemical vapor deposition of copper using Cu(dmamb)2
- 저자
- BYUN, Dong Jin
- 발행일
- 2011-12-07
- 학회명
- The 7th International Conference on Advanced Materials and Devices
- 개최국가
- 대한민국
- 학회 개최일
- 2011-12-07 ~ 2011-12-09