Fabrication of a transparent conducting Ni-nanomesh-embedded film using template-assisted Ni electrodeposition and hot transfer process

초록

In the present work, we developed a new method for fabricating Ni nanomeshes for transparent conducting electrodes using template-assisted Ni electrodeposition and a hot transfer process. By employing the direct printing of hydrogen silsesquioxane (HSQ), the microscale HSQ template was successfully transferred onto a stainless steel substrate. The Ni nanomesh was fabricated using selective Ni electrodeposition and a hot transfer process on a polycarbonate (PC) film. The Ni-nanomesh-embedded PC film exhibited approximately 77% of the transmittance of the PC film and a sheet resistance of 2-10 Omega sq(-1). In addition, the transmittance and sheet resistance of the Ni-nanomesh-embedded PC film were not significantly degraded after 20 000 cycles of bending tests.

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