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The development of SiO2 hole pattern fabrication using photoresist without etching for the selective area growth of GaN
The development of SiO2 hole pattern fabrication using photoresist without etching for the selective area growth of GaN
- 제목
- The development of SiO2 hole pattern fabrication using photoresist without etching for the selective area growth of GaN
- 제목 (타언어)
- The development of SiO2 hole pattern fabrication using photoresist without etching for the selective area growth of GaN
- 저자
- BYUN, Dong Jin
- 발행일
- 2021-11-25
- 학회명
- 2021년도 한국재료학회 추계학술대회
- 개최국가
- 대한민국
- 학회 개최일
- 2021-11-24 ~ 2021-11-26